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Comparative study of CF<sub>4</sub> + X + He (X = C<sub>4</sub>F<sub>8</sub> or C<sub>4</sub>H<sub>2</sub>F<sub>6</sub>) plasmas for high aspect ratio etching of SiO<sub>2</sub> with ACL mask.
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- Plasma Processes & Polymers, 2024, v. 21, n. 9, p. 1, doi. 10.1002/ppap.202400046
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Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O 2 /Ar Plasma.
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- Materials (1996-1944), 2024, v. 17, n. 16, p. 3917, doi. 10.3390/ma17163917
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- Article
Fibers, sizings, effects on plasma treatment.
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- Technical Textiles / Technische Textilen, 2015, v. 58, n. 4, p. E185
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- Article
Theobromine enhances absorption of cacao polyphenol in rats.
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- Bioscience, Biotechnology & Biochemistry, 2014, v. 78, n. 12, p. 2059, doi. 10.1080/09168451.2014.942252
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- Article
Towards Long‐Term Photostability of Nickel Hydroxide/BiVO<sub>4</sub> Photoanodes for Oxygen Evolution Catalysts via In Situ Catalyst Tuning.
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- Angewandte Chemie, 2020, v. 132, n. 15, p. 6272, doi. 10.1002/ange.201915671
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- Article
Influence of the Chemical Composition and Topography of the Ti6Al7Nb Surface Etched in Fluorine Plasma on Its Selected Properties.
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- Advanced Engineering Materials, 2023, v. 25, n. 19, p. 1, doi. 10.1002/adem.202300507
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- Article
Dielectric Metalens by Multilayer Nanoimprint Lithography and Solution Phase Epitaxy.
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- Advanced Engineering Materials, 2023, v. 25, n. 16, p. 1, doi. 10.1002/adem.202201824
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- Article
Highly Anisotropic Fluorine‐Based Plasma Etching of Ultralow Expansion Glass.
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- Advanced Engineering Materials, 2021, v. 23, n. 6, p. 1, doi. 10.1002/adem.202001336
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- Article
Low Cost and High‐Aspect Ratio Micro/Nano Device Fabrication by Using Innovative Metal‐Assisted Chemical Etching Method.
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- Advanced Engineering Materials, 2019, v. 21, n. 8, p. N.PAG, doi. 10.1002/adem.201900490
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- Article
Barrier inhomogeneities in titanium Schottky contacts formed on argon plasma etched p-type SiGe.
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- Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 3, p. 1527, doi. 10.1007/s10854-014-1763-z
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- Article
Improvement and characteristics of conical silicon emitters employing wet-dry etching.
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- Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 1, p. 31, doi. 10.1007/s10854-013-1502-x
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- Article
Improving the quality of GaN epilayer by preparing a novel patterned sapphire substrate.
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- Journal of Materials Science: Materials in Electronics, 2014, v. 25, n. 1, p. 267, doi. 10.1007/s10854-013-1582-7
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- Article
Characteristics of GaN thin films by inductively coupled plasma etching with Cl/BCl and Cl/Ar.
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- Journal of Materials Science: Materials in Electronics, 2012, v. 23, n. 6, p. 1224, doi. 10.1007/s10854-011-0577-5
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- Article
Impact of plasma etching on fabrication technology of liquid crystal polymer printed circuit board.
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- Journal of Materials Science: Materials in Electronics, 2010, v. 21, n. 9, p. 954, doi. 10.1007/s10854-009-0024-z
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- Article
The kinetics of conductivity type conversion in HgCdTe by ion beam milling.
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- Journal of Materials Science: Materials in Electronics, 2008, v. 19, n. 10, p. 965, doi. 10.1007/s10854-007-9428-9
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- Article
Hydrophobisation of lignocellulosic materials part I: physical modification.
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- Cellulose, 2022, v. 29, n. 10, p. 5375, doi. 10.1007/s10570-022-04620-8
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- Article
Study the Effect of Etching Time on the Characteristics of the Porous Silicon that Prepare from N-Type Silicon by Photoelectrochemical Etching Method .
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- Journal of College of Education, 2022, n. 1, p. 12
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- Article
Effect of Plasma Treatment on the Physical Properties of PMMA/HA Composite.
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- Journal of College of Education, 2021, n. 4, p. 1
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Study the Morphological and Optical Properties of CdO doped ZnO thin films prepared by(PLD)Technique.
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- Journal of College of Education, 2018, n. 2, p. 147
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Study the Morphological and Optical Properties of CdO doped ZnO thin films prepared by(PLD)Technique.
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- Journal of College of Education, 2018, n. 1, p. 147
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- Article
微热辅助低温等离子体杀菌技术对榨菜贮藏期品质劣变的影响.
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- China Brewing, 2023, v. 42, n. 2, p. 151, doi. 10.11882/j.issn.0254-5071.2023.02.025
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- Article
تأثيخ نافث البالزما حاجد العدل على أنبات سبعة أصشاف من نبات البخوكلي.
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- College of Basic Education Researches Journal, 2021, v. 17, n. 3, p. 1336
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Analysis of the surface hardness of niobium carbide coatings deposited on commercially pure titanium and Ti-6Al-7Nb alloy implant materials using the glow discharge plasma technique.
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- Misan Journal of Academic Studies, 2023, v. 22, n. 48, p. 264, doi. 10.54633/2333-022-048-020
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- Article
THE USE OF ONE-COMPONENT PLASMA IN THE ICP-RIE ETCHING PROCESS OF PERIODIC STRUCTURES FOR APPLICATIONS IN PHOTODETECTOR ARRAYS.
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- Metrology & Measurement Systems, 2023, v. 30, n. 4, p. 809, doi. 10.24425/mms.2023.147955
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- Article
On the importance of cavity-length and heat dissipation in GaN-based vertical-cavity surface-emitting lasers.
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- Scientific Reports, 2015, p. 9600, doi. 10.1038/srep09600
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- Article
Biomimetic Transferable Surface for a Real Time Control over Wettability and Photoerasable Writing with Water Drop Lens.
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- Scientific Reports, 2014, p. 1, doi. 10.1038/srep07407
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- Article
Pd/Alumina Catalysts for Beneficial Transformation of Harmful Freon R-22.
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- Catalysts (2073-4344), 2021, v. 11, n. 10, p. 1178, doi. 10.3390/catal11101178
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- Article
Self-aligned molding technology (SAMT) for fabrication of 3D structures with a foldable imprint mold.
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- Applied Nanoscience, 2019, v. 9, n. 6, p. 1255, doi. 10.1007/s13204-019-01050-0
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- Article
Fabrication and properties of one-mask-patterned ferroelectric integrated capacitors.
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- Electrical Engineering in Japan, 1997, v. 121, n. 1, p. 43, doi. 10.1002/(SICI)1520-6416(199710)121:1<43::AID-EEJ6>3.0.CO;2-#
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- Article
High density lithium niobate photonic integrated circuits.
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- Nature Communications, 2023, v. 14, n. 1, p. 1, doi. 10.1038/s41467-023-40502-8
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- Article
Shift endpoint trace selection algorithm and wavelet analysis to detect the endpoint using optical emission spectroscopy.
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- Photonic Sensors, 2016, v. 6, n. 2, p. 158, doi. 10.1007/s13320-016-0280-5
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- Article
Nanosphere Lithography-Based Fabrication of Spherical Nanostructures and Verification of Their Hexagonal Symmetries by Image Analysis.
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- Symmetry (20738994), 2022, v. 14, n. 12, p. 2642, doi. 10.3390/sym14122642
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Water desalination using nanoporous single-layer graphene.
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- Nature Nanotechnology, 2015, v. 10, n. 5, p. 459, doi. 10.1038/nnano.2015.37
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Nanoporous graphene: Membranes at the limit.
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- Nature Nanotechnology, 2015, v. 10, n. 5, p. 385, doi. 10.1038/nnano.2015.77
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- Article
Maximizing visible Raman resolution of nanodiamond grains fabricated by coaxial arc plasma deposition through oxygen plasma etching optimization.
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- Surface & Interface Analysis: SIA, 2024, v. 56, n. 4, p. 230, doi. 10.1002/sia.7289
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- Article
Study of silicon surface micro‐roughness generated by SF<sub>6</sub> remote plasma etching.
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- Surface & Interface Analysis: SIA, 2023, v. 55, n. 5, p. 357, doi. 10.1002/sia.7198
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- Article
The influence of Ti plasma etching pre‐treatment on mechanical properties of DLC film on cemented carbide.
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- Surface & Interface Analysis: SIA, 2022, v. 54, n. 5, p. 477, doi. 10.1002/sia.7053
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- Article
Combined analysis methods for investigating titanium and nickel surface contamination after plasma deep etching.
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- Surface & Interface Analysis: SIA, 2022, v. 54, n. 2, p. 134, doi. 10.1002/sia.7030
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- Article
Mechanisms of hydrophobization of polymeric composites etched in CF<sub>4</sub> plasma.
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- Surface & Interface Analysis: SIA, 2017, v. 49, n. 4, p. 334, doi. 10.1002/sia.6104
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- Article
Effect of height and atomic arrangement of the super-tip of a gas field ion emitter on helium ion beam current.
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- Surface & Interface Analysis: SIA, 2016, v. 48, n. 11, p. 1132, doi. 10.1002/sia.6092
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- Article
Effect of Phosphate Buffered Saline Solutions on Top-Down Fabricated ZnO Nanowire Field Effect Transistor.
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- Journal of Nanomaterials, 2017, p. 1, doi. 10.1155/2017/5413705
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- Article
Performance of GaN-Based LEDs with Nanopatterned Indium Tin Oxide Electrode.
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- Journal of Nanomaterials, 2016, p. 1, doi. 10.1155/2016/8202405
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- Article
Correlation of Plasma Erosion Resistance and the Microstructure of YF3 Coatings Prepared by Vacuum Kinetic Spray.
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- Journal of Thermal Spray Technology, 2020, v. 29, n. 5, p. 1016, doi. 10.1007/s11666-020-01019-4
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APC for plasma etch.
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- Solid State Technology, 2001, v. 44, n. 10, p. 71
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Asuka project to select tools this year.
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- Solid State Technology, 2001, v. 44, n. 8, p. S4
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- Article
Plasma etch rates: The impact of mask transmittance.
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- Solid State Technology, 2001, v. 44, n. 8, p. 55
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- Article
Laser etching for flip-chip de-bug and inverse stereolithography for MEMS.
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- Solid State Technology, 2001, v. 44, n. 6, p. 145
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Optimizing plasma etch for MEMS devices.
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- Solid State Technology, 2001, v. 44, n. 6, p. 135
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Ccd-controlled in situ interferometry for dry etch process monitoring.
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- Solid State Technology, 2001, v. 44, n. 6, p. 117
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Evaluating plasma-etch resistance of high-performance plastics.
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- Solid State Technology, 2001, v. 44, n. 4, p. 91
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- Article