Found: 1
Select item for more details and to access through your institution.
Angular Dependence of Si<sub>3</sub>N<sub>4</sub> Etching in C<sub>4</sub>F<sub>6</sub>/CH<sub>2</sub>F<sub>2</sub>/O<sub>2</sub>/Ar Plasmas.
- Published in:
- Chemical Engineering & Technology, 2017, v. 40, n. 12, p. 2251, doi. 10.1002/ceat.201700126
- By:
- Publication type:
- Article