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Dislocation-Related Photoluminescence in Silicon Implanted with Germanium Ions.
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- Semiconductors, 2019, v. 53, n. 2, p. 156, doi. 10.1134/S1063782619020234
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- Article
Influence of Annealing Temperature on Electrically Active Centers in Silicon Implanted with Germanium Ions.
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- Semiconductors, 2019, v. 53, n. 2, p. 153, doi. 10.1134/S1063782619020222
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- Article
Influence of an Increase in the Implantation Dose of Erbium Ions and Annealing Temperature on Photoluminescence in AlGaN/GaN Superlattices and GaN Epitaxial Layers.
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- Semiconductors, 2005, v. 39, n. 9, p. 1045, doi. 10.1134/1.2042596
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- Article
Low-temperature photoluminescence in holmium-doped silicon.
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- Semiconductors, 1999, v. 33, n. 4, p. 407, doi. 10.1134/1.1187703
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Influence of rapid high-temperature anneals on the photoluminescence of erbium-doped GaN in the wavelength interval 1.0-1.6 μm.
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- Semiconductors, 1999, v. 33, n. 1, p. 1, doi. 10.1134/1.1187636
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- Article
Formation of donor centers upon annealing of dysprosium- and holmium-implanted silicon
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- Semiconductors, 1998, v. 32, n. 9, p. 921, doi. 10.1134/1.1187515
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- Article
Photoluminescence of erbium in amorphous hydrogenated phosphorus-doped silicon.
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- Semiconductors, 1997, v. 31, n. 7, p. 738, doi. 10.1134/1.1187081
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- Article
Depth Profiling of Layered Si−O−Al Thin Films with Secondary Ion Mass Spectrometry and Rutherford Backscattering Spectrometry.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2019, v. 13, n. 2, p. 300, doi. 10.1134/S102745101902023X
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- Article
Study of Multilayer Thin Film Structures by Rutherford Backscattering Spectrometry.
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- Technical Physics Letters, 2019, v. 45, n. 6, p. 609, doi. 10.1134/S1063785019060191
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- Article