Properties of Al 2 O 3 Thin Films Grown by PE-ALD at Low Temperature Using H 2 O and O 2 Plasma Oxidants.

Published in:

Coatings (2079-6412), 2021, v. 11, n. 10, p. 1266, doi. 10.3390/coatings11101266

By:

• Castillo-Saenz, Jhonathan;
• Nedev, Nicola;
• Valdez-Salas, Benjamín;
• Curiel-Alvarez, Mario;
• Mendivil-Palma, María Isabel;
• Hernandez-Como, Norberto;
• Martinez-Puente, Marcelo;
• Mateos, David;
• Perez-Landeros, Oscar;
• Martinez-Guerra, Eduardo

Publication type:

Article