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Growth Behavior and Electrical Properties of a (Na<sub>0.5</sub>K<sub>0.5</sub>)NbO<sub>3</sub>Thin Film Deposited on a Pt/Ti/SiO<sub>2</sub>/Si Substrate Using RFMagnetron Sputtering.
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- Journal of the American Ceramic Society, 2011, v. 94, n. 7, p. 1970, doi. 10.1111/j.1551-2916.2011.04574.x
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- Article