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Correlation between Density of Reentry Plasma and Frequency of Attenuated Electromagnetic Signals Based on Laboratory Measurements.
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- Aerospace (MDPI Publishing), 2023, v. 10, n. 1, p. 87, doi. 10.3390/aerospace10010087
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Silicon Oxide Etching Process of NF 3 and F 3 NO Plasmas with a Residual Gas Analyzer.
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- Materials (1996-1944), 2021, v. 14, n. 11, p. 3026, doi. 10.3390/ma14113026
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Necking Reduction at Low Temperature in Aspect Ratio Etching of SiO 2 at CF 4 /H 2 /Ar Plasma.
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- Nanomaterials (2079-4991), 2024, v. 14, n. 2, p. 209, doi. 10.3390/nano14020209
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- Article