Found: 4
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A novel positive resist for deep UV lithography.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 13, p. 856, doi. 10.1002/pen.760291305
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- Article
N-phenylglycine-(thio)xanthene dye photoinitiating system and application to photopolymer for visible laser exposure.
- Published in:
- Journal of Applied Polymer Science, 1989, v. 38, n. 7, p. 1271, doi. 10.1002/app.1989.070380707
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- Article
An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate- co-methacrylic acid).
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- Journal of Applied Polymer Science, 1993, v. 50, n. 2, p. 243, doi. 10.1002/app.1993.070500205
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- Article
Fluorine-containing photoreactive polyimide. II. Preparation and properties of self-sensitized polyimide precursors.
- Published in:
- Journal of Applied Polymer Science, 1990, v. 41, n. 5/6, p. 929, doi. 10.1002/app.1990.070410505
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- Article