Found: 5
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Cyclic etching of silicon oxide using NF<sub>3</sub>/H<sub>2</sub> remote plasma and NH<sub>3</sub> gas flow.
- Published in:
- Plasma Processes & Polymers, 2021, v. 18, n. 11, p. 1, doi. 10.1002/ppap.202100063
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- Article
Determination of Motivating Factors of Urban Forest Visitors through Latent Dirichlet Allocation Topic Modeling.
- Published in:
- International Journal of Environmental Research & Public Health, 2021, v. 18, n. 18, p. 9649, doi. 10.3390/ijerph18189649
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- Article
Selective isotropic etching of SiO<sub>2</sub> over Si<sub>3</sub>N<sub>4</sub> using NF<sub>3</sub>/H<sub>2</sub> remote plasma and methanol vapor.
- Published in:
- Scientific Reports, 2023, v. 13, n. 1, p. 1, doi. 10.1038/s41598-023-38359-4
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- Article
Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam.
- Published in:
- Plasma Processes & Polymers, 2019, v. 16, n. 9, p. N.PAG, doi. 10.1002/ppap.201900081
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- Article
Selective etching of silicon nitride over silicon oxide using ClF<sub>3</sub>/H<sub>2</sub> remote plasma.
- Published in:
- Scientific Reports, 2022, v. 12, n. 1, p. 1, doi. 10.1038/s41598-022-09252-3
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- Article