OpenURL Connection Search

Select item for more details and to access through your institution.

Back Cover: Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition (Angew. Chem. Int. Ed. 51/2013).
Published in:
Angewandte Chemie International Edition, 2013, v. 52, n. 51, p. 13824, doi. 10.1002/anie.201309934
By:
- O'Neill, Brandon J.;
- Jackson, David H. K.;
- Crisci, Anthony J.;
- Farberow, Carrie A.;
- Shi, Fengyuan;
- Alba‐Rubio, Ana C.;
- Lu, Junling;
- Dietrich, Paul J.;
- Gu, Xiangkui;
- Marshall, Christopher L.;
- Stair, Peter C.;
- Elam, Jeffrey W.;
- Miller, Jeffrey T.;
- Ribeiro, Fabio H.;
- Voyles, Paul M.;
- Greeley, Jeffrey;
- Mavrikakis, Manos;
- Scott, Susannah L.;
- Kuech, Thomas F.;
- Dumesic, James A.
Publication type:
Article
Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition.
Published in:
Angewandte Chemie International Edition, 2013, v. 52, n. 51, p. 13808, doi. 10.1002/anie.201308245
By:
- O'Neill, Brandon J.;
- Jackson, David H. K.;
- Crisci, Anthony J.;
- Farberow, Carrie A.;
- Shi, Fengyuan;
- Alba‐Rubio, Ana C.;
- Lu, Junling;
- Dietrich, Paul J.;
- Gu, Xiangkui;
- Marshall, Christopher L.;
- Stair, Peter C.;
- Elam, Jeffrey W.;
- Miller, Jeffrey T.;
- Ribeiro, Fabio H.;
- Voyles, Paul M.;
- Greeley, Jeffrey;
- Mavrikakis, Manos;
- Scott, Susannah L.;
- Kuech, Thomas F.;
- Dumesic, James A.
Publication type:
Article
Electrocatalysts: In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS2 Basal Planes for Efficient Hydrogen Evolution Reaction (Adv. Funct. Mater. 34/2017).
Published in:
Advanced Functional Materials, 2017, v. 27, n. 34, p. n/a, doi. 10.1002/adfm.201701825
By:
- Kim, Youngmin;
- Jackson, David H. K.;
- Lee, Daewon;
- Choi, Min;
- Kim, Tae‐Wan;
- Jeong, Soon‐Yong;
- Chae, Ho‐Jeong;
- Kim, Hyun Woo;
- Park, Noejung;
- Chang, Hyunju;
- Kuech, Thomas F.;
- Kim, Hyung Ju
Publication type:
Article
In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS2 Basal Planes for Efficient Hydrogen Evolution Reaction.
Published in:
Advanced Functional Materials, 2017, v. 27, n. 34, p. n/a, doi. 10.1002/adfm.201701825
By:
- Kim, Youngmin;
- Jackson, David H. K.;
- Lee, Daewon;
- Choi, Min;
- Kim, Tae‐Wan;
- Jeong, Soon‐Yong;
- Chae, Ho‐Jeong;
- Kim, Hyun Woo;
- Park, Noejung;
- Chang, Hyunju;
- Kuech, Thomas F.;
- Kim, Hyung Ju
Publication type:
Article
Tungsten hexacarbonyl and hydrogen peroxide as precursors for the growth of tungsten oxide thin films on titania nanoparticles.
Published in:
AIChE Journal, 2014, v. 60, n. 4, p. 1278, doi. 10.1002/aic.14397
By:
- Jackson, David H. K.;
- Dunn, Bryan A.;
- Guan, Yingxin;
- Kuech, Thomas F.
Publication type:
Article
Rücktitelbild: Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition (Angew. Chem. 51/2013).
Published in:
Angewandte Chemie, 2013, v. 125, n. 51, p. 14068, doi. 10.1002/ange.201309934
By:
- O'Neill, Brandon J.;
- Jackson, David H. K.;
- Crisci, Anthony J.;
- Farberow, Carrie A.;
- Shi, Fengyuan;
- Alba ‐ Rubio, Ana C.;
- Lu, Junling;
- Dietrich, Paul J.;
- Gu, Xiangkui;
- Marshall, Christopher L.;
- Stair, Peter C.;
- Elam, Jeffrey W.;
- Miller, Jeffrey T.;
- Ribeiro, Fabio H.;
- Voyles, Paul M.;
- Greeley, Jeffrey;
- Mavrikakis, Manos;
- Scott, Susannah L.;
- Kuech, Thomas F.;
- Dumesic, James A.
Publication type:
Article
Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition.
Published in:
Angewandte Chemie, 2013, v. 125, n. 51, p. 14053, doi. 10.1002/ange.201308245
By:
- O'Neill, Brandon J.;
- Jackson, David H. K.;
- Crisci, Anthony J.;
- Farberow, Carrie A.;
- Shi, Fengyuan;
- Alba ‐ Rubio, Ana C.;
- Lu, Junling;
- Dietrich, Paul J.;
- Gu, Xiangkui;
- Marshall, Christopher L.;
- Stair, Peter C.;
- Elam, Jeffrey W.;
- Miller, Jeffrey T.;
- Ribeiro, Fabio H.;
- Voyles, Paul M.;
- Greeley, Jeffrey;
- Mavrikakis, Manos;
- Scott, Susannah L.;
- Kuech, Thomas F.;
- Dumesic, James A.
Publication type:
Article
Control of Thickness and Chemical Properties of Atomic Layer Deposition Overcoats for Stabilizing Cu/γ-Al2O3 Catalysts.
Published in:
ChemSusChem, 2014, v. 7, n. 12, p. 3247, doi. 10.1002/cssc.201402832
By:
- O'Neill, Brandon J.;
- Sener, Canan;
- Jackson, David H. K.;
- Kuech, Thomas F.;
- Dumesic, James A.
Publication type:
Article

Found: 8

Back Cover: Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition (Angew. Chem. Int. Ed. 51/2013).

Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition.

Electrocatalysts: In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS<sub>2</sub> Basal Planes for Efficient Hydrogen Evolution Reaction (Adv. Funct. Mater. 34/2017).

In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS<sub>2</sub> Basal Planes for Efficient Hydrogen Evolution Reaction.

Tungsten hexacarbonyl and hydrogen peroxide as precursors for the growth of tungsten oxide thin films on titania nanoparticles.

Rücktitelbild: Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition (Angew. Chem. 51/2013).

Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition.

Control of Thickness and Chemical Properties of Atomic Layer Deposition Overcoats for Stabilizing Cu/γ-Al<sub>2</sub>O<sub>3</sub> Catalysts.