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Use of hexamethyldisiloxane for p-type microcrystalline silicon oxycarbide layers.
- Published in:
- EPJ Photovoltaics, 2016, v. 7, p. 1, doi. 10.1051/epjpv/2015010
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- Article
Effect of carbon containing SiN<sub>x</sub> antireflection coating on the screen-printed contact and low illumination performance of silicon solar cell Effect of carbon containing SiN<sub>x</sub> antireflection coating on the screen-printed contact and low illumination performance of silicon solar cell
- Published in:
- Progress in Photovoltaics, 2013, v. 21, n. 3, p. 351, doi. 10.1002/pip.1184
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- Article
Analysis of p-type SiO <sub>x</sub> layers as a boron diffusion source for n-type c-Si substrates.
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- Physica Status Solidi. A: Applications & Materials Science, 2016, v. 213, n. 7, p. 1760, doi. 10.1002/pssa.201532912
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- Article
Quasi-fivefold symmetric electron diffraction patterns due to multiple twinning in silicon thin films grown from hexamethyldisiloxane.
- Published in:
- Journal of Applied Crystallography, 2016, v. 49, n. 6, p. 2226, doi. 10.1107/S1600576716016848
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- Article