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Optical properties of silicon carbonitride films produced by plasma-induced decomposition of organic silicon compounds.
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- High Energy Chemistry, 2015, v. 49, n. 4, p. 273, doi. 10.1134/S0018143915040074
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- Article
Synthesis of Hydrogenated Silicon Oxycarbonitride from a Gas Mixture of Methyltris(Diethylamino)Silane, Nitrogen, and Oxygen.
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- Glass Physics & Chemistry, 2018, v. 44, n. 6, p. 607, doi. 10.1134/S1087659618060056
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Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy.
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- Glass Physics & Chemistry, 2017, v. 43, n. 5, p. 410, doi. 10.1134/S1087659617050042
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Synthesis of Si-C-N-Fe films from volatile organosilicon substances-precursors and ferrocene. Part II. Properties of SiCNFe films obtained by thermal decomposition of tris(diethylamino)silane and ferrocene.
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- Glass Physics & Chemistry, 2016, v. 42, n. 5, p. 490, doi. 10.1134/S1087659616050126
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- Article
Synthesis of Si-C-N-Fe layers from volatile organosilicon precursors and ferrocene. part I. synthesis, chemical and phase composition of iron-containing layers prepared by thermal decomposition of ferrocene.
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- Glass Physics & Chemistry, 2015, v. 41, n. 6, p. 630, doi. 10.1134/S1087659615060048
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Hydrogenated silicon oxycarbonitride films. Part III. Thermodynamic modeling of the Si-C-N-O-H system.
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- Glass Physics & Chemistry, 2015, v. 41, n. 3, p. 334, doi. 10.1134/S1087659615030062
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Hydrogenated silicon oxycarbonitride films. Part II. Physicochemical and functional properties.
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- Glass Physics & Chemistry, 2014, v. 40, n. 6, p. 643, doi. 10.1134/S1087659614060042
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Films of hydrogenated silicon oxycarbonitride. Part I. Chemical and phase composition.
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- Glass Physics & Chemistry, 2014, v. 40, n. 5, p. 570, doi. 10.1134/S1087659614050034
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Synthesis of silicon carbonitride dielectric films with improved optical and mechanical properties from tetramethyldisilazane.
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- Glass Physics & Chemistry, 2013, v. 39, n. 1, p. 77, doi. 10.1134/S1087659613010057
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Tris(diethylamino)silane-A new precursor compound for obtaining layers of silicon carbonitride.
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- Glass Physics & Chemistry, 2012, v. 38, n. 1, p. 15, doi. 10.1134/S1087659612010051
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Preparation of nanocrystalline titanium carbonitride coatings using Ti(N(Et)).
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- Glass Physics & Chemistry, 2011, v. 37, n. 3, p. 322, doi. 10.1134/S1087659611030023
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Plasma enhanced chemical deposition of nanocrystalline silicon carbonitride films from trimethyl(phenylamino)silane.
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- Glass Physics & Chemistry, 2011, v. 37, n. 3, p. 316, doi. 10.1134/S1087659611030114
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Plasma-chemical synthesis of silicon carbonitride films from trimethyl(diethylamino)silane.
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- Glass Physics & Chemistry, 2010, v. 36, n. 4, p. 497, doi. 10.1134/S1087659610040152
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Use of hexamethylcyclotrisilazane for preparation of transparent films of complex compositions.
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- Glass Physics & Chemistry, 2009, v. 35, n. 3, p. 274, doi. 10.1134/S1087659609030067
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SYNTHESIS OF MAGNETIC NANOCOMPOSITE FILMS SiCxNyFez BY PLASMA-ENHANCED CHEMICAL DECOMPOSITION OF A GASEOUS MIXTURE OF 1,1,1,3,3,3-HEXAMETHYLDISILAZANE, FERROCENE, AND HELIUM.
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- Journal of Structural Chemistry, 2020, v. 61, n. 12, p. 1865, doi. 10.1134/S0022476620120045
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Physicochemical Properties and Structure of SiC<sub>x</sub>N<sub>y</sub>:Fe Films Grown From a Gas Mixture of Ferrocene, Hydrogen and 1,1,3,3,5,5-Hexamethylcyclotrisilazane.
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- Journal of Structural Chemistry, 2018, v. 59, n. 7, p. 1588, doi. 10.1134/S0022476618070107
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Effect of synthesis conditions on the structure and properties of new SiC<sub><italic>x</italic></sub>N<sub><italic>y</italic></sub>M<sub><italic>z</italic></sub> materials for spintronics.
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- Journal of Structural Chemistry, 2017, v. 58, n. 8, p. 1493, doi. 10.1134/S0022476617080030
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Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films.
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- Journal of Structural Chemistry, 2017, v. 58, n. 1, p. 119, doi. 10.1134/S0022476617010188
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The phase composition and physicochemical properties of transparent nanocomposite films of silicon oxycarbonitride.
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- Journal of Structural Chemistry, 2016, v. 57, n. 6, p. 1209, doi. 10.1134/S0022476616060226
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- Article
Structural defects in SiCNH films obtained by plasma-enhanced chemical deposition from hexamethyldisilazane vapor.
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- Journal of Structural Chemistry, 2015, v. 56, n. 6, p. 1070, doi. 10.1134/S0022476615060074
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Grazing incidence X-ray diffraction (GIRXD) study of the phase composition of SiCFe and SiCNFe thin films.
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- Journal of Structural Chemistry, 2015, v. 56, n. 6, p. 1176, doi. 10.1134/S0022476615060244
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Phase composition of thin silicon carbonitride films obtained by plazma endanced chemical vapour deposition using organosilicon compounds.
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- Journal of Structural Chemistry, 2015, v. 56, n. 1, p. 163, doi. 10.1134/S0022476615010229
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On the formation of the crystalline phases and nanostructure of silicon carbonitride layers grown on gallium arsenide substrates.
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- Journal of Structural Chemistry, 2012, v. 53, n. 4, p. 805, doi. 10.1134/S0022476612040270
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Composition and structure of silicon carbonitride layers grown on Si(100)/(Fe, N, Co) substrates.
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- Journal of Structural Chemistry, 2012, v. 53, n. 4, p. 812, doi. 10.1134/S0022476612040282
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Elemental composition analysis of silicon carbonitride thin films by energy dispersive spectroscopy.
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- Journal of Structural Chemistry, 2010, v. 51, p. 179, doi. 10.1007/s10947-010-0210-0
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Synthesis of Highly Transparent SiCxNyOz:H Films via Plasma-Chemical Decomposition of 1,1,3,3,5,5-Hexamethylcyclotrisilazane, Oxygen, and Nitrogen Gas Mixture.
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- Russian Journal of General Chemistry, 2019, v. 89, n. 11, p. 2290, doi. 10.1134/S1070363219110203
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From organosilicon precursors to multifunctional silicon carbonitride.
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- Russian Journal of General Chemistry, 2012, v. 82, n. 1, p. 43, doi. 10.1134/S1070363212010070
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Chemical character of BC.
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- XRS: X-ray Spectrometry, 2009, v. 38, n. 1, p. 68, doi. 10.1002/xrs.1117
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- Article
Properties of BC<sub> x</sub>N<sub> y</sub> films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures.
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- Inorganic Materials, 2010, v. 46, n. 5, p. 487, doi. 10.1134/S0020168510050092
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Thermodynamic modeling of BC<sub> x</sub>N<sub> y</sub> chemical vapor deposition from mixtures of N-trimethylborazine and nitrogen.
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- Inorganic Materials, 2009, v. 45, n. 12, p. 1342, doi. 10.1134/S0020168509120061
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Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane.
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- Inorganic Materials, 2003, v. 39, n. 4, p. 366, doi. 10.1023/A:1023227716045
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- Article