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Influence of the Finite-Size Effect on the Cluster Ion Emission of Silicon Nanostructures.
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- JETP Letters, 2020, v. 112, n. 3, p. 467, doi. 10.1134/S0021364020080123
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- Article
Influence of the Finite-Size Effect on the Cluster Ion Emission of Silicon Nanostructures.
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- JETP Letters, 2020, v. 111, n. 8, p. 467, doi. 10.1134/S0021364020080123
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- Article
Development of Software-Controlled Systems for Monitoring Physical Parameters of Nuclear Research Reactor Radiation.
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- Physics of Atomic Nuclei, 2018, v. 81, n. 11, p. 1606, doi. 10.1134/S1063778818100149
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- Article
High-Sensitivity Fast Neutron Detector KNK-2-8M.
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- Physics of Atomic Nuclei, 2017, v. 80, n. 8, p. 1348, doi. 10.1134/S1063778817080105
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- Article
Relaxation Process in Crude Oil after Ultrasonic Treatment.
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- International Journal of Engineering Transactions B: Applications, 2024, v. 37, n. 5, p. 896, doi. 10.5829/ije.2024.37.05b.08
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- Article
Unveiling the Potential of Cavitation Erosion-Induced Heavy Crude Oil Upgrading.
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- Fluids, 2023, v. 8, n. 10, p. 274, doi. 10.3390/fluids8100274
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- Article
SCRAP METAL PROCUREMENT AND OPERATIONS WITH IT: TODAY'S CRIMINAL SITUATION.
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- Scientific Bulletin of National Mining University, 2021, n. 4, p. 145, doi. 10.33271/nvngu/2021-4/145
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- Article
Polymorphism in chalcogenides of alkaline-earth metals.
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- Semiconductor Physics, Quantum Electronics & Optoelectronics, 2005, v. 8, n. 4, p. 115
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- Article
Relaxation Process in Crude Oil after Ultrasonic Treatment.
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- International Journal of Engineering Transactions C: Aspects, 2024, v. 37, n. 5, p. 896, doi. 10.5829/ije.2024.37.05b.08
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- Article
A comprehensive structural analysis of silicon carbide layers grown by vacuum epitaxy on silicon from hydrides and hydrocarbons.
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- Journal of Structural Chemistry, 2010, v. 51, p. 145, doi. 10.1007/s10947-010-0204-y
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- Article
<sup>28</sup>SiO<sub>2</sub>-Based Isotopically Enriched Silica Fiber.
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- Inorganic Materials, 2023, v. 59, n. 6, p. 591, doi. 10.1134/S0020168523060158
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- Article
Isotope-modified silicon layers obtained by plasma enhanced chemical vapor deposition from gaseous silicon tetrafluoride.
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- Technical Physics Letters, 2009, v. 35, n. 10, p. 948, doi. 10.1134/S1063785009100216
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- Article
Room-temperature photoconductivity in the 1–2.6 µm range in InAs/GaAs heterostructures with quantum dots.
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- Technical Physics Letters, 2008, v. 34, n. 1, p. 1, doi. 10.1134/S106378500801001X
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- Article
Electron Transport Effects in the IR Photoconductivity of InGaAs/GaAs Structures with Quantum Dots.
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- Technical Physics Letters, 2004, v. 30, n. 9, p. 795, doi. 10.1134/1.1804599
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- Article
A New Method for Determining the Sharpness of InGaAs/GaAs Heterojunctions by Auger Depth Profiling.
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- Technical Physics Letters, 2001, v. 27, n. 10, p. 868, doi. 10.1134/1.1414559
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- Article
Subnanometer Resolution in Depth Profiling Using Glancing Auger Electrons.
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- Technical Physics Letters, 2001, v. 27, n. 2, p. 114, doi. 10.1134/1.1352765
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- Article
Single-Crystalline GaAs, AlGaAs, and InGaAs Layers Grown by Metalorganic VPE on Porous GaAs Substrates.
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- Technical Physics Letters, 2000, v. 26, n. 4, p. 298, doi. 10.1134/1.1262823
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- Article
Possibility of nondestructive layer-by-layer analysis of multilayer structures of ultrathin films using low-energy hydrogen ions.
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- Technical Physics Letters, 1999, v. 25, n. 6, p. 442, doi. 10.1134/1.1262510
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- Article
Influence of screening on calculations on the total energy of calcium oxide.
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- Technical Physics Letters, 1999, v. 25, n. 4, p. 278, doi. 10.1134/1.1262451
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- Article
Influence of desorption on the composition of high-temperature superconducting thin films during magnetron sputtering.
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- Technical Physics Letters, 1998, v. 24, n. 12, p. 952
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- Article
Secondary-Ion Mass Spectroscopy for Analysis of the Implanted Hydrogen Profile in Silicon and Impurity Composition of Silicon-on-Insulator Structures.
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- Technical Physics, 2020, v. 65, n. 11, p. 1767, doi. 10.1134/S106378422011002X
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- Article
Formation of Low-Resistivity Au/Mo/Ti Ohmic Contacts to p-Diamond Epitaxial Layers.
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- Technical Physics, 2019, v. 64, n. 12, p. 1827, doi. 10.1134/S1063784219120041
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Use of related parameters in X-ray diffraction analysis of multilayer structures with allowance for the layer growth time.
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- Technical Physics, 2014, v. 59, n. 3, p. 402, doi. 10.1134/S1063784214030293
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- Article
Influence of the Substrate Material on the Structural Properties of Cadmium Telluride Films.
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- Journal of Nano- & Electronic Physics, 2024, v. 16, n. 4, p. 1, doi. 10.21272/jnep.16(4).04023
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SEARCH AND REMOVAL OF PROHIBITED ITEMS FROM THE HUMAN BODY: MEDICAL– PROCEDURAL ASPECT.
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- Wiadomości Lekarskie, 2021, v. 74, n. 11, Part 2, p. 3048, doi. 10.36740/WLek202111232
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- Article
Ion-plasma treatment of reed switch contacts: A study by time-of-flight secondary ion mass spectrometry.
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- Journal of Analytical Chemistry, 2014, v. 69, n. 13, p. 1245, doi. 10.1134/S1061934814130115
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- Article
Novel microwave plasma-assisted CVD reactor for diamond delta doping.
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- Physica Status Solidi - Rapid Research Letters, 2016, v. 10, n. 4, p. 324, doi. 10.1002/pssr.201510453
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- Article
Plasma Chemical Deposition of Hydrogenated DLC Films with Different Hydrogen and sp<sup>3</sup>-Hybrid Carbon Content.
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- Semiconductors, 2024, v. 58, n. 1, p. 57, doi. 10.1134/S1063782624010123
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- Article
Effect of the Chloropentafluoroethane Additive in Chlorine-Containing Plasma on the Etching Rate and Etching-Profile Characteristics of Gallium Arsenide.
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- Semiconductors, 2021, v. 55, n. 11, p. 865, doi. 10.1134/S1063782621100171
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- Article
Doping of Carbon Layers Grown by the Pulsed Laser Technique.
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- Semiconductors, 2021, v. 55, n. 8, p. 660, doi. 10.1134/S1063782621080054
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- Article
Carbon Films Produced by the Pulsed Laser Method and Their Influence on the Properties of GaAs Structures.
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- Semiconductors, 2020, v. 54, n. 9, p. 1059, doi. 10.1134/S1063782620090079
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- Article
Formation of Ohmic Contacts to a Diamond-Like Carbon Layer Deposited on a Dielectric Diamond Substrate.
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- Semiconductors, 2020, v. 54, n. 9, p. 1056, doi. 10.1134/S1063782620090213
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- Article
Modification of the Ratio between sp<sup>2</sup>- to sp<sup>3</sup>-Hybridized Carbon Components in PECVD Diamond-Like Films.
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- Semiconductors, 2020, v. 54, n. 9, p. 1047, doi. 10.1134/S1063782620090316
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- Article
Formation of Carbon Layers by the Thermal Decomposition of Carbon Tetrachloride in a Reactor for MOCVD Epitaxy.
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- Semiconductors, 2020, v. 54, n. 8, p. 956, doi. 10.1134/S106378262008028X
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- Article
Ohmic Contacts to CVD Diamond with Boron-Doped Delta Layers.
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- Semiconductors, 2019, v. 53, n. 10, p. 1348, doi. 10.1134/S106378261910004X
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- Article
Comparative Analysis of the Luminescence of Ge:Sb Layers Grown on Ge(001) and Si(001) Substrates.
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- Semiconductors, 2019, v. 53, n. 10, p. 1318, doi. 10.1134/S1063782619100154
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- Article
Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond.
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- Semiconductors, 2019, v. 53, n. 9, p. 1203, doi. 10.1134/S1063782619090136
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- Article
Influence of Annealing on the Properties of Ge:Sb/Si(001) Layers with an Antimony Concentration Above Its Equilibrium Solubility in Germanium.
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- Semiconductors, 2019, v. 53, n. 7, p. 882, doi. 10.1134/S106378261907025X
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- Article
Plasma Chemical Etching of Gallium Arsenide in C<sub>2</sub>F<sub>5</sub>Cl-Based Inductively Coupled Plasma.
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- Semiconductors, 2018, v. 52, n. 11, p. 1473, doi. 10.1134/S1063782618110180
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- Article
Antimony segregation in Si layers grown by molecular beam epitaxy on Si wafers with different crystallographic orientations.
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- Semiconductors, 2017, v. 51, n. 12, p. 1552, doi. 10.1134/S1063782617120211
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- Article
Features of the selective manganese doping of GaAs structures.
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- Semiconductors, 2017, v. 51, n. 11, p. 1415, doi. 10.1134/S1063782617110148
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- Article
Low-temperature deposition of SiN Films in SiH/Ar + N inductively coupled plasma under high silane dilution with argon.
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- Semiconductors, 2017, v. 51, n. 11, p. 1449, doi. 10.1134/S1063782617110215
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Erratum to: 'Atomic composition and electrical characteristics of epitaxial CVD diamond layers doped with boron'.
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- 2017
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- Erratum
Atomic composition and electrical characteristics of epitaxial CVD diamond layers doped with boron.
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- Semiconductors, 2016, v. 50, n. 12, p. 1569, doi. 10.1134/S1063782616120204
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- Article
Heavily doped GaAs:Te layers grown by MOVPE using diisopropyl telluride as a source.
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- Semiconductors, 2016, v. 50, n. 11, p. 1439, doi. 10.1134/S1063782616110075
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- Article
Effect of thermal annealing on the photoluminescence of structures with InGaAs/GaAs quantum wells and a low-temperature GaAs layer δ-doped with Mn.
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- Semiconductors, 2016, v. 50, n. 11, p. 1469, doi. 10.1134/S1063782616110129
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- Article
Epitaxial GaN layers formed on langasite substrates by the plasma-assisted MBE method.
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- Semiconductors, 2016, v. 50, n. 11, p. 1511, doi. 10.1134/S1063782616110166
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- Article
Stimulated emission from a metamorphic GaAsSb bulk layer on a GaAs substrate.
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- Semiconductors, 2016, v. 50, n. 5, p. 586, doi. 10.1134/S106378261605002X
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- Article
Epitaxially Grown Monoisotopic Si, Ge, and SiGe Alloy Layers: Production and Some Properties.
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- Semiconductors, 2016, v. 50, n. 3, p. 345, doi. 10.1134/S1063782616030064
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- Article
SiN layers for the in-situ passivation of GaN-based HEMT structures.
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- Semiconductors, 2015, v. 49, n. 11, p. 1421, doi. 10.1134/S1063782615110251
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- Article