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Analysis of Heat Flow for In Vitro Culture Monitored by Impedance Measurement.
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- Energies (19961073), 2022, v. 15, n. 21, p. 8231, doi. 10.3390/en15218231
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Multi-Domain Modeling and Simulations of the Heterogeneous Systems.
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- Journal of Telecommunications & Information Technology, 2010, v. 2010, n. 1, p. 34, doi. 10.26636/jtit.2010.1.1061
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- Article
Modeling, Simulation and Calibration of Silicon Wet Etching.
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- Journal of Telecommunications & Information Technology, 2009, v. 2009, n. 4, p. 65, doi. 10.26636/jtit.2009.4.974
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- Article
Composition and electrical properties of ultra-thin SiO<sub>x</sub>N<sub>y</sub> layers formed by rf plasma nitrogen implantation/plasma oxidation processes.
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- Journal of Telecommunications & Information Technology, 2007, v. 2007, n. 3, p. 9, doi. 10.26636/jtit.2007.3.820
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- Article
Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology.
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- Journal of Telecommunications & Information Technology, 2007, v. 2007, n. 3, p. 3, doi. 10.26636/jtit.2007.3.819
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- Article
Comparison of composition ultra-thin silicon oxynitride layers' fabricated by PECVD and ultrashallow rf plasma ion implantation.
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- Journal of Telecommunications & Information Technology, 2007, v. 2007, n. 3, p. 20, doi. 10.26636/jtit.2007.3.822
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- Article