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Ein seltenes Low‐Spin‐Co<sup>IV</sup>‐Bis(β‐silyldiamid) mit hoher thermischer Stabilität: Sterische Erzwingung einer Dublettkonfiguration.
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- Angewandte Chemie, 2020, v. 132, n. 33, p. 14242, doi. 10.1002/ange.202001518
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- Article
Silver Thin‐Film Electrodes Grown by Low‐Temperature Plasma‐Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure.
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- Advanced Materials Technologies, 2023, v. 8, n. 1, p. 1, doi. 10.1002/admt.202200796
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- Article
Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al<sub>2</sub>O<sub>3</sub> atomic layer deposition.
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- Surface & Interface Analysis: SIA, 2023, v. 55, n. 12, p. 886, doi. 10.1002/sia.7256
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- Article
Investigation of an atomic-layer-deposited Al<sub>2</sub>O<sub>3</sub> diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform.
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- Surface & Interface Analysis: SIA, 2021, v. 53, n. 8, p. 727, doi. 10.1002/sia.6955
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- Article
Conformal Zn‐Benzene Dithiol Thin Films for Temperature‐Sensitive Electronics Grown via Industry‐Feasible Atomic/Molecular Layer Deposition Technique.
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- Small, 2024, v. 20, n. 40, p. 1, doi. 10.1002/smll.202402608
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- Article
Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of their Manifold Structural Chemistry and Thermal Properties**.
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- European Journal of Inorganic Chemistry, 2021, v. 2021, n. 48, p. 5119, doi. 10.1002/ejic.202100851
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- Article
Direct‐Patterning ZnO Deposition by Atomic‐Layer Additive Manufacturing Using a Safe and Economical Precursor.
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- Small, 2023, v. 19, n. 36, p. 1, doi. 10.1002/smll.202301774
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- Article
Size and Shape Exclusion in 2D Silicon Dioxide Membranes.
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- Small, 2023, v. 19, n. 9, p. 1, doi. 10.1002/smll.202205602
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- Article
Size and Shape Exclusion in 2D Silicon Dioxide Membranes.
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- Small, 2023, v. 19, n. 9, p. 1, doi. 10.1002/smll.202205602
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- Article
An Unusual Tri‐coordinate Co(II) Silylamide with Potential for Chemical Vapor Deposition Processes.
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- Zeitschrift für Anorganische und Allgemeine Chemie, 2022, v. 648, n. 24, p. 1, doi. 10.1002/zaac.202200249
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- Article
Cover Feature: Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide (Chem. Eur. J. 31/2019).
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- Chemistry - A European Journal, 2019, v. 25, n. 31, p. 7406, doi. 10.1002/chem.201901358
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- Article
Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide.
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- Chemistry - A European Journal, 2019, v. 25, n. 31, p. 7489, doi. 10.1002/chem.201900475
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- Article
A Rare Low‐Spin Co<sup>IV</sup> Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration.
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- Angewandte Chemie International Edition, 2020, v. 59, n. 33, p. 14138, doi. 10.1002/anie.202001518
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- Article
Interplay of Precursor and Plasma for The Deposition of HfO<sub>2</sub> via PEALD: Film Growth and Dielectric Properties.
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- Advanced Materials Interfaces, 2023, v. 10, n. 28, p. 1, doi. 10.1002/admi.202300244
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- Article
Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction.
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- Advanced Materials Interfaces, 2022, v. 9, n. 35, p. 1, doi. 10.1002/admi.202201709
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- Article
Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO<sub>2</sub> Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.
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- Advanced Materials Interfaces, 2019, v. 6, n. 1, p. N.PAG, doi. 10.1002/admi.201801540
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- Article
Cover Feature: Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application (Chem. Eur. J. 15/2021).
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- Chemistry - A European Journal, 2021, v. 27, n. 15, p. 4758, doi. 10.1002/chem.202005268
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- Article
Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application.
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- Chemistry - A European Journal, 2021, v. 27, n. 15, p. 4913, doi. 10.1002/chem.202003907
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- Article
PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth.
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- Plasma Processes & Polymers, 2024, v. 21, n. 2, p. 1, doi. 10.1002/ppap.202300150
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PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films.
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- Plasma Processes & Polymers, 2024, v. 21, n. 3, p. 1, doi. 10.1002/ppap.202300186
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- Article