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Amorphous chalcogenide AgSbS<sub>2</sub> films prepared by pulsed laser deposition.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1561, doi. 10.1007/s00339-004-2847-z
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- Article
Hole drilling in stainless steel and silicon by femtosecond pulses at low pressure.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1555, doi. 10.1007/s00339-004-2846-0
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Nd : YAG laser cladding of marine propeller with hastelloy C-22.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1583, doi. 10.1007/s00339-004-2854-0
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Initial stage of laser ablation of LiCaAlF<sub>6</sub> single crystal under F<sub>2</sub> laser irradiation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1579, doi. 10.1007/s00339-004-2853-1
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Formation of embedded patterns in glasses using femtosecond irradiation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1549, doi. 10.1007/s00339-004-2845-1
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Parallel nanostructuring of GeSbTe film with particle mask.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1603, doi. 10.1007/s00339-004-2860-2
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Rare earth doped α-alumina thin films prepared by pulsed laser deposition: structural and optical properties.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1599, doi. 10.1007/s00339-004-2859-8
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Modelling laser cleaning of low-absorbing substrates: the effect of near-field focussing.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1595, doi. 10.1007/s00339-004-2858-9
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Silicon clusters produced by femtosecond laser ablation: non-thermal emission and gas-phase condensation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1591, doi. 10.1007/s00339-004-2856-y
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Pulsed laser deposition of metals in various inert gas atmospheres.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1587, doi. 10.1007/s00339-004-2855-z
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- Article
Swelling and modification of silicone surface by F<sub>2</sub> laser irradiation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1571, doi. 10.1007/s00339-004-2850-4
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Amorphous carbon nitride film preparation by plasma-assisted pulsed laser deposition method.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1575, doi. 10.1007/s00339-004-2852-2
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- Article
AgAsS<sub>2</sub> amorphous chalcogenide films prepared by pulsed laser deposition.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1563, doi. 10.1007/s00339-004-2848-y
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SiO<sub>2</sub> films fabricated by F<sub>2</sub> laser-induced chemical deposition using silicone rubber.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1567, doi. 10.1007/s00339-004-2849-x
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Correlation between surface oxide and photoluminescence properties of Si nanoparticles prepared by pulsed laser ablation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1545, doi. 10.1007/s00339-004-2844-2
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Low-temperature growth of SnO<sub>2</sub> film prepared by XeCl excimer laser MOD process.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1541, doi. 10.1007/s00339-004-2843-3
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Preparation and characterization of La<sub>0.8</sub>Sr<sub>0.2</sub>MnO<sub>3</sub> thin films by an excimer laser MOD process for a bolometer.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1537, doi. 10.1007/s00339-004-2842-4
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Pulsed laser deposition of amorphous carbon nitride thin films and their electrical properties.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1533, doi. 10.1007/s00339-004-2840-6
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Pulsed laser deposition of hard magnetic films.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1529, doi. 10.1007/s00339-004-2839-z
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Pulsed laser deposition of non-stoichiometric silicon nitride (SiN<sub>x</sub>) thin films.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1525, doi. 10.1007/s00339-004-2838-0
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Degenerate electrical conductive and excitonic photoluminescence properties of epitaxial films of wide gap p-type layered oxychalcogenides, LnCuOCh (Ln=La, Pr and Nd; Ch=S or Se).
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1521, doi. 10.1007/s00339-004-2837-1
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Heteroepitaxial growth of wide gap p-type semiconductors: LnCuOCh (Lr=La, Pr and Nd; Ch=S or Se) by reactive solid-phase epitaxy.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1517, doi. 10.1007/s00339-004-2836-2
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YAG Laser Face Joining Technology of A6061 Aluminium and SPCC Plates.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1513, doi. 10.1007/s00339-004-2835-3
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Crack-free processing of glasses by 1 μm-YAG laser and translucent adhesive tape and its numerical analyses by CIP.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1509, doi. 10.1007/s00339-004-2832-6
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Pulsed laser deposition of NiMnGa thin films on silicon.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1505, doi. 10.1007/s00339-004-2831-7
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Analysis of laser-induced vibrations to detect non-adhesive regions of coatings.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1501, doi. 10.1007/s00339-004-2830-8
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Characterization of Low Pressure DMA System for the size selection of magnetic nano-particles.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1497, doi. 10.1007/s00339-004-2829-1
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Development of a target for laser-produced plasma EUV light source using Sn nano-particles.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1493, doi. 10.1007/s00339-004-2828-2
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Fabrication of oxide base nanostructures using pulsed laser ablation in aqueous solutions.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1489, doi. 10.1007/s00339-004-2827-3
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The effects of ambient oxygen pressure on the 1.54 μm photoluminescence of Er-doped silicon-rich silicon oxide films grown by laser ablation of a Si+Er target.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1485, doi. 10.1007/s00339-004-2826-4
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Preparation of carbon nitride film by cryogenic laser processing.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1477, doi. 10.1007/s00339-004-2821-9
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Lithographical laser ablation using femtosecond laser.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1481, doi. 10.1007/s00339-004-2825-5
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Optical and structural properties of calix[4]arene thin films elaborated by pulsed laser deposition.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1473, doi. 10.1007/s00339-004-2819-3
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Microstructural investigation of Ca<sub>x</sub>Co<sub>4</sub>Sb<sub>12</sub> films prepared by pulsed laser deposition.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1465, doi. 10.1007/s00339-004-2812-x
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Chemistry and microstructure of PLD (Ti,Al)C<sub>x</sub>N<sub>1-x</sub> coatings deposited at room temperature.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1469, doi. 10.1007/s00339-004-2817-5
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Fabrication of stress-induced SrRuO<sub>3</sub> nanostructures by pulsed laser deposition.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1461, doi. 10.1007/s00339-004-2811-y
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Fabrication of diamond-like carbon thin films by femtosecond laser ablation of frozen acetone.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1457, doi. 10.1007/s00339-004-2810-z
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Formation and characterization of polyperinaphthalenic organic semiconductor nanoparticles by laser ablation of mixture targets of a perylene derivative with cobalt powder at 355 nm.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1449, doi. 10.1007/s00339-004-2808-6
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Pulsed laser deposition of metallic multilayers: the influence of laser power on microstructure.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1453, doi. 10.1007/s00339-004-2809-5
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- Article
Magneto-photoluminescence of novel magnetic semiconductor Zn<sub>1-x</sub>Cr<sub>x</sub>O grown by PLD method.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1445, doi. 10.1007/s00339-004-2807-7
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Evidence by spectroscopic ellipsometry of optical property change in pulsed laser deposited NiO films when heated in air at Neel temperature.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1439, doi. 10.1007/s00339-004-2806-8
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Surface nanostructuring of metals by laser irradiation: effects of pulse duration, wavelength and gas atmosphere.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1433, doi. 10.1007/s00339-004-2804-x
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Sub–damage–threshold femtosecond laser ablation from crystalline Si: surface nanostructures and phase transformation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1429, doi. 10.1007/s00339-004-2803-y
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In situ spectroscopic measurement of structural change in SiO<sub>2</sub> during femtosecond laser irradiation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1425, doi. 10.1007/s00339-004-2802-z
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ZnO nano-rods synthesized by nano-particle-assisted pulsed-laser deposition.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1417, doi. 10.1007/s00339-004-2797-5
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Effect of insitu annealing on physical properties of Si nanoparticles synthesized by pulsed laser ablation.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1421, doi. 10.1007/s00339-004-2800-1
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A pulsed laser ablation/plasma chemical vapor deposition tandem system for combinatorial device fabrication.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1413, doi. 10.1007/s00339-004-2796-6
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KrF pulsed laser deposition of chromium oxide thin films from Cr<sub>8</sub>O<sub>21</sub> targets.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1409, doi. 10.1007/s00339-004-2795-7
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The effect of oxygen rf discharge on pulsed laser deposition of oxide films.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1405, doi. 10.1007/s00339-004-2794-8
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Characterizaton of pulsed laser deposited SmFeO<sub>3</sub> morphology: effect of fluence, substrate temperature and oxygen pressure.
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- Applied Physics A: Materials Science & Processing, 2004, v. 79, n. 4-6, p. 1399, doi. 10.1007/s00339-004-2792-x
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