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- Title
Impact of layer thickness on the architectural and nonlinear optical characteristics of molybdenum trioxide (MoO<sub>3</sub>) films.
- Authors
Sharma, Chetan; Barala, Monika; Yadav, Sandeep; Mohan, Devendra
- Abstract
Optical limiters, as nonlinear optical devices, serve critical roles in protecting delicate optical sensors from laser damage and in regulating laser radiation in various optical computing systems. This study delves into the adjustable nonlinear optical (NLO) absorption characteristics of MoO3 thin films on the glass substrate, examined through the open aperture Z-scan technique with 5 ns Nd-YAG laser pulses at 532 nm. The NLO absorption behavior of the MoO3 films demonstrates a clear dependence on film thickness. Notably, the NLO absorption coefficient (β) increases as the film thickness grows from 150 to 400 nm, a trend attributed to the two-photon absorption (TPA) mechanism. This study achieves a tuning of optical limiting from 1.05 to 0.75 J/cm2, correlated with variations in film thickness. Additionally, a decrease in band gap with increasing thickness is observed, alongside increases in both linear and nonlinear refraction indices, which are linked to a rise in defect centers. A structural and morphological assessment revealed the amorphous nature of the films and their smooth surface morphology. This comprehensive investigation provides a new dimension to the exploration of MoO3 thin films in the optics and laser technology fields, paving the way for developing optical limiters for optoelectronic devices.
- Publication
Journal of Materials Science: Materials in Electronics, 2024, Vol 35, Issue 21, p1
- ISSN
0957-4522
- Publication type
Article
- DOI
10.1007/s10854-024-13218-8