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- Title
Synthesis of a photo-patternable cross-linked epoxy system containing photodegradable carbonate units for deep UV lithography.
- Authors
Huh, Geun; Kwon, Ki-Ok; Cha, Sang-Ho; Yoon, Sang-Woong; Lee, Moo Young; Lee, Jong-Chan
- Abstract
The article discusses a study which synthesized bis(2-(oxiran-2-ylmethyl)-1,3-dioxoisoindolin-5-yl) carbonate and polymers and methacrylic acid (MAA) monomeric units and examined the photo degradation process of the epoxy system. It notes that a cross-linked epoxy film was generated through a reaction between oxirane groups in bis(2-(oxiran-2-ylmethyl)-1,3-dioxoisoindolin-5-yl) carbonate and carboxylic acid in the polymer. It also notes the high reflective index and absorption of the copolymer.
- Subjects
EPOXY compounds; CARBONATES; METHACRYLIC acid; LITHOGRAPHY; COPOLYMERS; POLYMERS
- Publication
Journal of Applied Polymer Science, 2009, Vol 114, Issue 4, p2093
- ISSN
0021-8995
- Publication type
Article
- DOI
10.1002/app.29870