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- Title
Influence of deposition parameters on preferred orientation of RF magnetron sputtered BST thin films.
- Authors
Songzhan Li; Yanqin Yang; Liu, L.; Zhang, T. J.; Huang, W. H.
- Abstract
Ba0.65Sr0.35TiO3 (BST) thin films have been deposited by radio frequency magnetron sputtering. The effects of the deposition parameters on the crystallization and microstructure of BST thin films were investigated by X-ray diffraction and field emission scanning electron microscopy, respectively. The crystallization behavior of these films was apparently affected by the substrate temperature, annealing temperature and sputtering pressure. The as-deposited thin films at room temperature were amorphous. However, the improved crystallization is observed for BST thin films deposited at higher temperature. As the annealing temperature increased, the dominant X-ray diffraction peaks became sharper and more intense. The dominant diffraction peaks increased with the sputtering pressures increasing as the films deposited at 0.37–1.2 Pa. With increasing the sputtering pressure up to 3.9 Pa, BST thin films had the (110) + (200) preferred orientation. Possible correlations of the crystallization with changes in the sputtering pressure were discussed. The SEM morphologies indicated the film was small grains, smooth, and the interface between the film and the substrate was sharp and clear.
- Subjects
THIN films; SOLID state electronics; PHYSICAL &; theoretical chemistry; RADIO frequency; FREQUENCIES of oscillating systems; RADIO measurements; FREQUENCY stability; CONSTITUTION of matter
- Publication
Journal of Materials Science: Materials in Electronics, 2008, Vol 19, Issue 3, p223
- ISSN
0957-4522
- Publication type
Article
- DOI
10.1007/s10854-007-9270-0