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- Title
Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials.
- Authors
Wang, Xiao-Dong; Chen, Bo; Wang, Hai-Feng; He, Fei; Zheng, Xin; He, Ling-Ping; Chen, Bin; Liu, Shi-Jie; Cui, Zhong-Xu; Yang, Xiao-Hu; Li, Yun-Peng
- Abstract
Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF2 multilayer was successfully designed and fabricated and it shows high reflectance in 140-180 nm, suppressed reflectance in 120-137 nm and 181-220 nm.
- Subjects
FAR ultraviolet radiation; ULTRAVIOLET filters; FABRICATION (Manufacturing); DESIGN; DIELECTRIC materials; PHYSICAL vapor deposition; REFLECTANCE measurement; OPTICAL thin films; REFLECTANCE
- Publication
Scientific Reports, 2015, p8503
- ISSN
2045-2322
- Publication type
Article
- DOI
10.1038/srep08503