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- Title
Initial stages of silicon-iron interface formation.
- Authors
Gomoyunova, M.; Grebenyuk, G.; Popov, K.; Pronin, I.
- Abstract
The formation of a silicon-iron (Si/Fe) interface has been studied in situ by the method of high-resolution photoelectron spectroscopy using synchrotron radiation. The experiments were performed under ultrahigh vacuum conditions (at a residual pressure of 3 × 10 Torr) in a range of Si coating thicknesses within 0.04-0.45 nm. It is established that the process begins with the formation of a FeSi silicide and Fe-Si solid solution on the iron substrate surface. As the Si coating thickness increases, the solid solution converts into ferromagnetic (FeSi) and nonmagnetic (FeSi) silicides. It is shown that thermostimulated solid-state reactions leading to the transformation of FeSi and FeSi silicides into a semiconducting β-FeSi silicide start at a temperature close to 600°C.
- Subjects
FERROSILICON; SURFACE chemistry; PHOTOELECTRON spectroscopy; SILICIDES; ULTRAHIGH vacuum; SOLID solutions
- Publication
Technical Physics Letters, 2013, Vol 39, Issue 4, p360
- ISSN
1063-7850
- Publication type
Article
- DOI
10.1134/S1063785013040184