Back to matchesWe found a matchYour institution may have rights to this item. Sign in to continue.TitleSub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays.AuthorsPark, Woongkyu; Rhie, Jiyeah; Kim, Na Yeon; Hong, Seunghun; Kim, Dai-SikPublicationScientific Reports, 2016, p23823ISSN2045-2322Publication typeArticleDOI10.1038/srep23823