We found a match
Your institution may have rights to this item. Sign in to continue.
- Title
Embracing Uncertainty: Modeling Uncertainty in EPMA—Part II.
- Authors
Ritchie, Nicholas W. M.
- Abstract
This, the second in a series of articles present a new framework for considering the computation of uncertainty in electron excited X-ray microanalysis measurements, will discuss matrix correction. The framework presented in the first article will be applied to the matrix correction model called “Pouchou and Pichoir’s Simplified Model” or simply “XPP.” This uncertainty calculation will consider the influence of beam energy, take-off angle, mass absorption coefficient, surface roughness, and other parameters. Since uncertainty calculations and measurement optimization are so intimately related, it also provides a starting point for optimizing accuracy through choice of measurement design.
- Publication
Microscopy & Microanalysis, 2021, Vol 27, Issue 1, p74
- ISSN
1431-9276
- Publication type
Article
- DOI
10.1017/S1431927620024691