We found a match
Your institution may have rights to this item. Sign in to continue.
- Title
Fabrication of single-mode ridge SU-8 waveguides based on inductively coupled plasma etching.
- Authors
Wang, Xibin; Meng, Jie; Yue, Yuanbin; Sun, Jian; Sun, Xiaoqiang; Wang, Fei; Zhang, Daming
- Abstract
In this paper, a systematic study has been performed for the etching of negative photoresist SU-8 2005 using inductively coupled plasma. The etching rate, vertical profile, surface and sidewall roughness of the waveguide were investigated as a function of the chamber pressure, the bias power, the antenna power, the ratio of flow rate of Ar to O 2, and the etching time. The etching parameters were studied in detail and optimized to minimize the surface roughness in etched areas. Ridge MZI waveguides with SU-8 2005 were fabricated under the optimized etching conditions, resulting in smooth and almost vertical patterns. The waveguides showed single-mode propagation at 1550 nm wavelength and low propagation loss of less than 1.565 dB/cm, which was similar to the waveguides fabricated by the wet-etching technique.
- Subjects
PLASMA etching; MICROFABRICATION; INDUCTIVELY coupled plasma mass spectrometry; PHOTORESISTS; SURFACE roughness; THEORY of wave motion; RIDGE waveguides
- Publication
Applied Physics A: Materials Science & Processing, 2013, Vol 113, Issue 1, p195
- ISSN
0947-8396
- Publication type
Article
- DOI
10.1007/s00339-012-7514-1