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- Title
Silicone engineered anisotropic lithography for ultrahigh-density OLEDs.
- Authors
Kweon, Hyukmin; Choi, Keun-Yeong; Park, Han Wool; Lee, Ryungyu; Jeong, Ukjin; Kim, Min Jung; Hong, Hyunmin; Ha, Borina; Lee, Sein; Kwon, Jang-Yeon; Chung, Kwun-Bum; Kang, Moon Sung; Lee, Hojin; Kim, Do Hwan
- Abstract
Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of organic light-emitting diodes (OLEDs) from mobile and TV displays into near-to-eye microdisplays. However, current patterning techniques so far suffer from low resolution, consecutive pattern for RGB pixelation, low pattern fidelity, and throughput issue. Here, we present a silicone engineered anisotropic lithography of the organic light-emitting semiconductor (OLES) that in-situ forms a non-volatile etch-blocking layer during reactive ion etching. This unique feature not only slows the etch rate but also enhances the anisotropy of etch direction, leading to gain delicate control in forming ultrahigh-density multicolor OLES patterns (up to 4500 pixels per inch) through photolithography. This patterning strategy inspired by silicon etching chemistry is expected to provide new insights into ultrahigh-density OLED microdisplays. Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of OLEDs. Here, the authors report that silicone-incorporated organic light-emitting semiconductors can achieve anisotropic lithography via reactive ion etching-coupled photolithography, for ultrahigh-density RGB OLED arrays.
- Subjects
ORGANIC light emitting diodes; ELECTRON beam lithography; LITHOGRAPHY; ORGANIC semiconductors; PIXEL density measurement; LIGHT emitting diodes; SILICONES
- Publication
Nature Communications, 2022, Vol 13, Issue 1, p1
- ISSN
2041-1723
- Publication type
Article
- DOI
10.1038/s41467-022-34531-y