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- Title
Effect of Focussed Vacuum ARC Plasma Deposition on the Properties of Tetrahedral Amorphous Carbon Films.
- Authors
Chua, Daniel H. C.; Teo, K. B. K.; Tsai, T. H.; Robertson, J.; Milne, W. I.
- Abstract
We have investigated the effect of using a magnetic field to confine and focus the plasma in a Filtered Cathodic Vacuum Arc (FCVA) deposition system used for the preparation of tetrahedrally bonded amorphous carbon (ta-C) thin films. The design of the magnetic field is such that the plasma can be confined into a high-density focussed spot or de-focussed into a lower density wide beam. Increasing the magnetic field directly increases the plasma density and thus increases the deposition rate. The ta-C films grown in the magnetic field were subsequently characterised. EELS and Raman measurement were used to measure the sp3/sp2 ratio and UV-vis spectroscopy for optical bandgap studies. The intrinsic stress and I-V characteristics of the thin films were also studied. The results show that it is possible to deposit the films at rates as high as 2.5 nm/sec without adversely affecting the material properties.
- Subjects
CARBON compounds; THIN films; MAGNETIC fields; AMORPHOUS substances
- Publication
International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2002, Vol 16, Issue 6/7, p830
- ISSN
0217-9792
- Publication type
Article
- DOI
10.1142/S0217979202010464