We found a match
Your institution may have rights to this item. Sign in to continue.
- Title
A modified high-temperature vapour deposition technique for fabricating CH3NH3PbI3 thin films under an ambient atmosphere.
- Authors
Manobalaji, G; Pandiyarajan, M; Senthilkumar, M; Babu, S Moorthy
- Abstract
A modified two-step deposition technique was performed by vapour depositing methylammonium iodide (MAI) on lead iodide (PbI 2) films to fabricate good quality methylammonium lead iodide (MAPI) thin films under an ambient atmosphere, and their properties were compared with conventional two-step solution processed MAPI thin films. Scanning electron microscopy results depicted that the MAI vapour-processed films have a uniform coverage and planar surface compared with the non-uniformly distributed granule-like morphology of the solution-processed MAPI film. X-ray diffraction results confirm that the vapour-processed films have better crystallinity compared to the conventional solution-processed MAPI thin films. An enhancement in the optical absorption and emission was observed for the vapour-processed films. The higher processing temperature of the modified-vapour deposition eliminates the effect of moisture during the ambient atmosphere processing of the MAPI films.
- Subjects
THIN films; LEAD iodide; VAPORS; SCANNING electron microscopy; LIGHT absorption
- Publication
Bulletin of Materials Science, 2019, Vol 42, Issue 6, pN.PAG
- ISSN
0250-4707
- Publication type
Article
- DOI
10.1007/s12034-019-1956-4