Back to matchesWe found a matchYour institution may have rights to this item. Sign in to continue.TitleBoron diffusion behavior in silicon during shallow p<sup>+</sup>/ n junction formation by non-melt excimer laser annealing.AuthorsAid, Siti Rahmah; Matsumoto, Satoru; Fuse, GenshuPublicationPhysica Status Solidi. A: Applications & Materials Science, 2011, Vol 208, Issue 7, p1646ISSN1862-6300Publication typeArticleDOI10.1002/pssa.201026531