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Single crystal aluminum deposit formation on isotropic substrates by means of self-organized ion sputtering.
- Published in:
- Technical Physics Letters, 2006, v. 32, n. 10, p. 868, doi. 10.1134/S1063785006100154
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- Article
Selective processes that proceed during formation of aluminum layers near the phase equilibrium in a plasma-condensate system.
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- Technical Physics, 2008, v. 53, n. 10, p. 1364, doi. 10.1134/S1063784208100174
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- Article
Formation of nanosystems under near-equilibrium copper condensation in an ultrapure inert medium.
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- JETP Letters, 2008, v. 86, n. 12, p. 767, doi. 10.1134/S0021364007240046
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- Article
The Phase and Morphological Inhomogeneity of the Ti–C System Deposits Formed at the Plasma–Titanium Substrate Interface.
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- JETP Letters, 2003, v. 78, n. 4, p. 223, doi. 10.1134/1.1622036
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- Article
Formation of nickel extended surface upon quasi-equilibrium steady-state condensation.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2011, v. 5, n. 4, p. 667, doi. 10.1134/S1027451011070184
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- Article