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- Title
Simulation and experimental studies of FTO/WO<sub>3</sub> and FTO/WO<sub>3</sub>/Ag thin film structures for electrochromic analysis deposited by DC & RF magnetron sputtering.
- Authors
Kumar, Kilari Naveen; Nithya, G; Reddy, G Srinivas; Radhalayam, Dhanalakshmi; Prakash, Nunna Guru; Altaf, Mohammad; Ko, Tae Jo
- Abstract
In this work, DC & RF magnetron sputtering and COMSOL multiphysics were used to simulate and deposit WO3 and WO3/Ag films, respectively. In the simulation cyclic voltammetry (CV) analysis was examined. The current density for the WO3/Ag films in comparison to the WO3 film was displayed higher. Based on the simulation findings, the experiment was done using DC & RF magnetron sputtering to deposit WO3 and WO3/Ag films. Scanning electron microscopy (SEM), X-ray diffraction (XRD), UV–vis spectrometer, and electrochemical analyzer were used to examine the structural, morphological, EC, and optical characteristics of the deposited films. The SEM study revealed a smooth surface for WO3 films and WO3/Ag shows the grain of silver film. The XRD analysis of WO3 films shows the amorphous nature and in WO3/Ag films silver peaks were shown. The bandgap values were found to be 3.14 eV and 3.02 eV for WO3 and WO3/Ag films, respectively. Comparing the WO3/Ag film to the WO3 film, the cyclic voltammograms showed that the WO3/Ag film had the maximum current. In comparison to the WO3 film (30 cm2C−1), higher coloring efficiency values were noted for the WO3/Ag film (48 cm2C−1). For the WO3/Ag film, less time is needed for the coloring (tc = 2.2) and belching (tb = 1.8 s). It was clear that compared to a single-component WO3 film, the Ag-embedded WO3 composite system performed noticeably better electroactively and electrochemically.
- Publication
Journal of Materials Science: Materials in Electronics, 2024, Vol 35, Issue 24, p1
- ISSN
0957-4522
- Publication type
Article
- DOI
10.1007/s10854-024-13396-5