Back to matchesWe found a matchYour institution may have rights to this item. Sign in to continue.TitlePolymers for 193-nm Microlithography: Regioregular 2-Alkoxycarbonylnortricyclene Polymers by Controlled Cyclopolymerization of Bulky Ester Derivatives of Norbornadiene.AuthorsNiu, Q. Jason; Fréchet, Jean M. J.PublicationAngewandte Chemie International Edition, 1998, Vol 37, Issue 5, p667ISSN1433-7851Publication typeArticleDOI10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H