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- Title
Characterization of AlO thin films fabricated through atomic layer deposition on polymeric substrates.
- Authors
Ali, Kamran; Kim, Chang; Choi, Kyung-Hyun
- Abstract
This paper reports on the fabrication of good quality AlO thin films on flexible substrates including polyethylene naphthalate (PEN), polyethylene terephthalate (PET) and Polyamide at different temperatures down to 50 °C under very short water purging steps of 10 s. AlO films with appreciable growth rates having good morphological, chemical, electrical and optical characteristics have been produced. Growth rates of 1.16, 1.14 and 1.15 Å/cycle have been observed at 50 °C for PET, PEN and polyamide substrates respectively. The surface morphology has been improved with the increase in deposition temperature. Low average arithmetic roughness of 0.88 and 0.78 nm have been recorded for the AlO films deposited at 150 °C on PEN and polyamide respectively. The XPS analysis confirmed the fabrication of AlO films without any carbon contamination and Al 2p, Al 2s and O 1s peaks were appeared at binding energies of 74, 119 and 531 eV, respectively. Excellent insulating properties were observed for the AlO films and optical transmittance of more than 85 % was recorded in the visible region. The experimental results suggest that polymeric materials are excellent candidates to be used as substrates in the fabrication of AlO thin films through atomic layer deposition.
- Subjects
THIN film research; ATOMIC layer deposition; SUBSTRATES (Materials science); POLYETHYLENE naphthalate; POLYETHYLENE terephthalate; SURFACE morphology
- Publication
Journal of Materials Science: Materials in Electronics, 2014, Vol 25, Issue 4, p1922
- ISSN
0957-4522
- Publication type
Article
- DOI
10.1007/s10854-014-1821-6