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- Title
Phase-Controlled Deposition of Copper Sulfide Thin Films by Using Single-Molecular Precursors.
- Authors
Ashraf, Saba; Saeed, Aamer; Malik, Mohammad Azad; Flörke, Ulrich; Bolte, Michael; Haider, Naghmah; Akhtar, Javeed
- Abstract
Herein, we describe the synthesis and characterization of new ligands, N,N-diethyl- N′-(1-naphthoyl)thiourea ( 1a) and N,N-dipropyl- N′-(1-naphthoyl)thiourea ( 1b), and their complexes with copper, bis[ N, N-diethyl- N′-(1-naphthoyl)thioureato]CuII ( 2a) and bis[ N, N-dipropyl- N′-(1-naphthoyl)thioureato]CuII ( 2b). All four compounds (i.e., 1a, 1b, 2a, and 2b) were characterized by elemental analysis, 1H NMR and 13C NMR spectroscopy, and FTIR spectroscopy. The structures of compounds 1a, 1b, and 2b were determined by single-crystal X-ray diffraction analysis. Thermogravimetric analysis of 2a and 2b showed that both compounds decompose between 190 and 370 °C. Compounds 2a and 2b were then used as single-molecular precursors for the deposition of copper sulfide thin films through aerosol-assisted chemical vapor deposition. The phase and purity of the as-deposited thin films were confirmed by powdered X-ray diffraction, which showed that the as-grown films were composed of the orthorhombic (Cu7S4) phase only. Morphological studies of the as-deposited films were performed by using field-emission scanning electron microscopy. The elemental composition of the thin films was determined by energy-dispersive X-ray spectroscopy.
- Subjects
COPPER sulfide; THIN film research; LIGANDS (Chemistry); THIOUREA; THERMOGRAVIMETRY
- Publication
European Journal of Inorganic Chemistry, 2014, Vol 2014, Issue 3, p533
- ISSN
1434-1948
- Publication type
Article
- DOI
10.1002/ejic.201301008