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- Title
Characteristics assessment of TFT through 2D simulation under different material and structural configurations.
- Authors
Baroi, Oli Lowna; Ishraqul Huq, S. M.; Aura, Shourin R.; Marium, Taniza; Kabir, Md. Shaikh Abrar; Biswas, Satyendra N.
- Abstract
This paper presents a performance analysis of indium-gallium-zinc-oxide (IGZO)- and pentacene-based top-gate-top-contact (TGTC) and bottom-gate-top-contact (BGTC) thin film transistors (TFTs). Extensive simulation has been performed to assess the performances in terms of threshold voltage, subthreshold slope, on-off current ratio, mobility, and figure of merit (FoM). Results indicate a trade-off between mobility and current ratio with respect to the permittivity of the dielectric layer, where tantalum oxide (Ta2O 5) provides the optimum result in terms of FoM. The mobility of IGZO is significantly higher for both structures, whereas the current ratio for IGZO is higher than pentacene in the BGTC configuration. Comparing the structural configurations, Ta2O5-IGZO-based BGTC achieves 5. 9 2 × and 4 1. 8 × better mobility and current ratio, respectively, over TGTC structures. The threshold voltage of IGZO-based TFT is observed to increase with the permittivity of the dielectric in TGTC configuration but decrease in BGTC configuration. Meanwhile, the increase in oxide and active layer thicknesses causes a decrease in the threshold voltage. Moreover, both mobility and current ratio improve with a decrease in oxide or active layer thickness. Maximum mobility of 32.30 cm2/Vs and a maximum current ratio of 7.54E+08 are achieved for Ta2O5-IGZO-based BGTC TFT with 10 μ m channel thickness and 5 μ m oxide thickness.
- Subjects
THIN film transistors; THRESHOLD voltage; TANTALUM oxide; INDIUM gallium zinc oxide; PENTACENE; DIELECTRICS
- Publication
Modern Physics Letters B, 2024, Vol 38, Issue 2, p1
- ISSN
0217-9849
- Publication type
Article
- DOI
10.1142/S0217984923502615