Back to matchesWe found a matchYour institution may have rights to this item. Sign in to continue.TitleA sub-0.5 μm bilevel lithographic process using the deep-UV electron-beam resist p(si-cms).AuthorsNovembre, A. E.; Jurek, M. J.; Kornblit, A.; Reichmanis, E.PublicationPolymer Engineering & Science, 1989, Vol 29, Issue 14, p920ISSN0032-3888Publication typeArticleDOI10.1002/pen.760291408