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Fluorine-containing photoreactive polyimide. II. Preparation and properties of self-sensitized polyimide precursors.
- Published in:
- Journal of Applied Polymer Science, 1990, v. 41, n. 5/6, p. 929, doi. 10.1002/app.1990.070410505
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- Article
Magnetic filed effect on sensitized photocrosslinking reaction of azidomethylated polytsyrene.
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- Journal of Applied Polymer Science, 1989, v. 38, n. 11, p. 1997, doi. 10.1002/app.1989.070381104
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- Article
N-phenylglycine-(thio)xanthene dye photoinitiating system and application to photopolymer for visible laser exposure.
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- Journal of Applied Polymer Science, 1989, v. 38, n. 7, p. 1271, doi. 10.1002/app.1989.070380707
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- Article
Preparation and properties of soluble and colorless fluorine-containing photoreactive polyimide precursors.
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- Journal of Applied Polymer Science, 1989, v. 38, n. 3, p. 389, doi. 10.1002/app.1989.070380301
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- Article
Sensitivity and sensitization mechanism of halomethylated polystyrene to near UV region.
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- Journal of Applied Polymer Science, 1986, v. 32, n. 7, p. 6005, doi. 10.1002/app.1986.070320728
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- Article
Dynamic mechanical properties of photopolymerizable poly(vinyl alcohol)-acrylate monomer blends.
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- Journal of Applied Polymer Science, 1983, v. 28, n. 10, p. 3081, doi. 10.1002/app.1983.070281008
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- Article
VISUAL PIGMENTS-10. SPECTROSCOPY AND PHOTOPHYSICAL DYNAMICS OF RETINOL AND RETINYL ETHER.
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- Photochemistry & Photobiology, 1979, v. 29, n. 5, p. 1001, doi. 10.1111/j.1751-1097.1979.tb07804.x
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- Article
VISUAL PIGMENTS-V. GROUND AND EXCITED-STATE ACID DISSOCIATION CONSTANTS OF PROTONATED ALL-TRANS RETINAL SCHIFF BASE AND CORRELATION WITH THEORY.
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- Photochemistry & Photobiology, 1975, v. 21, n. 5, p. 297, doi. 10.1111/j.1751-1097.1975.tb06675.x
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- Article
Pyrromethene dye sensitized photopolymer—photochemical behavior in polymer matrix and application to photoresist for printed circuit board.
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- Polymers for Advanced Technologies, 2006, v. 17, n. 5, p. 348
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- Publication type:
- Article
The participation of the anion and alkyl substituent of diaryliodonium salts in photo‐initiated cationic polymerization reactions.
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- Polymers for Advanced Technologies, 2006, v. 17, n. 3, p. 156
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- Article
Vis-sensitive photopolymer containing vinyl ether compound and pyrromethene dye.
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- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 527, doi. 10.1002/pat.221
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- Article
Photo-alignment material with azobenzene-functionalized polymer linked in film.
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- Polymers for Advanced Technologies, 2002, v. 13, n. 7, p. 558, doi. 10.1002/pat.225
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- Article
Application of photopolymer to core-hair type microgels with various hair length.
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- Polymers for Advanced Technologies, 2002, v. 13, n. 1, p. 33, doi. 10.1002/pat.150
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- Article
Water-dispersible microgel modified with methacryloyl groups by ionic bonding on the surface and the photopolymer microgel.
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- Polymers for Advanced Technologies, 2000, v. 11, n. 6, p. 307, doi. 10.1002/1099-1581(200006)11:6<307::AID-PAT982>3.0.CO;2-T
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- Article
Sensitization mechanisms from excited-singlet state of pyrromethene dye to a radical-generating reagent in a poly(methylmethacrylate) film.
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- Polymers for Advanced Technologies, 1999, v. 10, n. 6, p. 321, doi. 10.1002/(SICI)1099-1581(199906)10:6<321::AID-PAT881>3.0.CO;2-C
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- Article
Photopolymerization mechanisms of acrylates in poly(methyl methacrylate) films.
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- Polymers for Advanced Technologies, 1999, v. 10, n. 4, p. 201, doi. 10.1002/(SICI)1099-1581(199904)10:4<201::AID-PAT860>3.0.CO;2-U
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- Article
Study of radical generated from coumarin dye-sensitized photo-initiator systems in high-speed photopolymer coating layers using laser flash photolysis.
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- Polymers for Advanced Technologies, 1998, v. 9, n. 12, p. 825, doi. 10.1002/(SICI)1099-1581(199812)9:12<825::AID-PAT821>3.0.CO;2-Z
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- Article
Tetrahydropyranyl-protected poly( p -hydroxystyrene) containing vinyl ether compound for three-component photopolymers.
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- Polymers for Advanced Technologies, 1998, v. 9, n. 9, p. 579, doi. 10.1002/(SICI)1099-1581(199809)9:9<579::AID-PAT816>3.0.CO;2-5
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- Article
Novel dual-mode photoresist based on decarboxylation by photogenerated base compound.
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- Polymers for Advanced Technologies, 1998, v. 9, n. 6, p. 326, doi. 10.1002/(SICI)1099-1581(199806)9:6<326::AID-PAT785>3.0.CO;2-5
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- Article
Thermal and acid-catalyzed reaction of bifunctional vinyl ether urethane in nonionic and ionic polymer matrices.
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- Polymers for Advanced Technologies, 1995, v. 6, n. 12, p. 733, doi. 10.1002/pat.1995.220061203
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- Publication type:
- Article
Three-component photopolymers based on thermal crosslinking and acidolytic de-crosslinking of vinyl ether groups. 2. effects of acid components on photopolymer characteristics.
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- Polymers for Advanced Technologies, 1995, v. 6, n. 8, p. 566, doi. 10.1002/pat.1995.220060803
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- Publication type:
- Article
Three-component photopolymer based on a novel mechanism: acid-catalyzed polymerization and decoupling of crosslinks.
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- Polymers for Advanced Technologies, 1994, v. 5, n. 9, p. 499, doi. 10.1002/pat.1994.220050906
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- Article
Use of functional microgels with vinyl groups to accelerate photopolymerization reaction.
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- Polymers for Advanced Technologies, 1994, v. 5, n. 6, p. 297, doi. 10.1002/pat.1994.220050601
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- Publication type:
- Article
Holographic recording using visible-light sensitive polymers based on cationic polycondensation.
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- Polymers for Advanced Technologies, 1994, v. 5, n. 2, p. 90, doi. 10.1002/pat.1994.220050202
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- Publication type:
- Article
A novel UV-sensitive photopolymerization system with microgel matrix.
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- Polymers for Advanced Technologies, 1994, v. 5, n. 2, p. 98, doi. 10.1002/pat.1994.220050203
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- Publication type:
- Article
Photoreactive fluorinated polyimide protected by a tetrahydropyranyl group (THP) based on photo-induced acidolysis.
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- Polymers for Advanced Technologies, 1993, v. 4, n. 4, p. 277, doi. 10.1002/pat.1993.220040408
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- Article
Photoreactive fluorinated polyimide protected by tetrahydropyranyl (THP) group based on chemical amplification: Acid generation in polyimide film and lithographic properties.
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- Polymers for Advanced Technologies, 1993, v. 4, n. 4, p. 294, doi. 10.1002/pat.1993.220040410
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- Article
Acid generation and deprotecting reaction by diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate in a novolak positive photoresist based on chemical amplification.
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- Polymers for Advanced Technologies, 1992, v. 3, n. 3, p. 117, doi. 10.1002/pat.1992.220030304
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- Article
Study of the crosslinking of polyvinyl alcohol by light-sensitive tetrazonium salts.
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- Journal of Applied Polymer Science, 1964, v. 8, n. 3, p. 1379, doi. 10.1002/app.1964.070080328
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- Article
An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate- co-methacrylic acid).
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- Journal of Applied Polymer Science, 1993, v. 50, n. 2, p. 243, doi. 10.1002/app.1993.070500205
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- Publication type:
- Article
Effect of Particle Size and Polarity of Long-Chain Molecules in Polymeric Films on the Supercooling Temperature.
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- High Performance Polymers, 1997, v. 9, n. 4, p. 369, doi. 10.1088/0954-0083/9/4/002
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- Article
[2.2](4,4′)Azobenzenophane.
- Published in:
- Angewandte Chemie International Edition, 1990, v. 29, n. 1, p. 105, doi. 10.1002/anie.199001051
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- Article
Surface-activated photopolymer microgels.
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- Advanced Materials, 1994, v. 6, n. 5, p. 417, doi. 10.1002/adma.19940060518
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- Article
Visible laser sensitive photopolymers initiated by dye sensitized peroxyester systems.
- Published in:
- Polymers for Advanced Technologies, 1990, v. 1, n. 5/6, p. 287, doi. 10.1002/pat.1990.220010502
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- Publication type:
- Article
A new positive-type photoreactive polyimide precursor using 1,4-dihydropyridine derivative.
- Published in:
- Polymer Engineering & Science, 1992, v. 32, n. 21, p. 1634, doi. 10.1002/pen.760322117
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- Publication type:
- Article
Dissolution inhibition mechanisms of naphthoquinone diazides.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 916, doi. 10.1002/pen.760291407
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- Article
A novel positive resist for deep UV lithography.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 13, p. 856, doi. 10.1002/pen.760291305
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- Publication type:
- Article