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- Title
A study of hydrogen plasma-induced charging effect in EUV lithography systems.
- Authors
Huang, Yao-Hung; Lin, Chrong Jung; King, Ya-Chin
- Abstract
In the extreme ultraviolet lithography system, EUV-induced hydrogen plasma charging effect is observed by in situ embedded micro-detector array. The 4k-pixel on-wafer array can detect and store the distributions of H2 plasma in each in-pixel floating gate for non-destructive off-line read. The local uniformity of H2 plasma intensity extracted by the threshold voltages on an array and its distributions across a wafer by the average bit cell current of MDAs provide insights into the detailed conditions inside advanced EUV lithography chambers.
- Subjects
EXTREME ultraviolet lithography; HYDROGEN plasmas; ELECTRIC charge; THRESHOLD voltage; COINCIDENCE; HYDROGEN
- Publication
Discover Nano, 2023, Vol 18, Issue 1, p1
- ISSN
2731-9229
- Publication type
Article
- DOI
10.1186/s11671-023-03799-4