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- Title
Growth and field crystallization of anodic films on Ta-Nb alloys.
- Authors
Komiyama, S.; Tsuji, E.; Aoki, Y.; Habazaki, H.; Santamaria, M.; Quarto, F.; Skeldon, P.; Thompson, G.
- Abstract
The growth behavior of amorphous anodic films on Ta-Nb solid solution alloys has been investigated over a wide composition range at a constant current density of 50 A m in 0.1 mol dm ammonium pentaborate electrolyte. The anodic films consist of two layers, comprising a thin outer NbO layer and an inner layer consisting of units of TaO and NbO. The outer NbO layer is formed as a consequence of the faster outward migration of Nb ions, compared with Ta ions, during film growth under the high electric field. Their relative migration rates are independent of the alloy composition. The formation ratio, density, and capacitance of the films show a linear relation to the alloy composition. The susceptibility of the anodic films to field crystallization during anodizing at constant voltage increases with increasing niobium content of the alloy.
- Subjects
CRYSTALLIZATION; ELECTROLYSIS; METALLIC composites; NIOBIUM-tantalum alloys; ELECTROCHEMISTRY
- Publication
Journal of Solid State Electrochemistry, 2012, Vol 16, Issue 4, p1595
- ISSN
1432-8488
- Publication type
Article
- DOI
10.1007/s10008-011-1565-7