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- Title
A negative tone lift-off method for small metal holes using PMMA/SiO<sub>2</sub> double layer.
- Authors
Baek, J S; Lee, D
- Abstract
We propose a novel method to fabricate small apertures in a metal film using polymethyl methacrylate (PMMA). A PMMA/SiO2 double layer is employed to perform a negative tone lift-off with SiO2 as a sacrificial layer. Through this method, we succeeded in making sub-50 nm holes in a metal film using well-established individual fabrication steps. The proposed method will be more reliable and economical compared to the hydrogen silsesquioxane/PMMA bilayer method.
- Publication
Bulletin of Materials Science, 2021, Vol 44, Issue 1, p1
- ISSN
0250-4707
- Publication type
Article
- DOI
10.1007/s12034-021-02568-2