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- Title
Self-organized near-field etching of the sidewalls of glass corrugations.
- Authors
Yatsui, T.; Hirata, K.; Tabata, Y.; Miyake, Y.; Akita, Y.; Yoshimoto, M.; Nomura, W.; Kawazoe, T.; Naruse, M.; Ohtsu, M.
- Abstract
Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser ( λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.
- Subjects
NEAR-fields; GLASS; SELF-organizing systems; FIELD theory (Physics); LIGHT sources; ATOMIC force microscopy; SURFACE roughness; LASERS
- Publication
Applied Physics B: Lasers & Optics, 2011, Vol 103, Issue 3, p527
- ISSN
0946-2171
- Publication type
Article
- DOI
10.1007/s00340-011-4569-1