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Controlling active nitrogen flux in plasma-assisted molecular beam epitaxy of group III nitrides.
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- Technical Physics Letters, 2007, v. 33, n. 4, p. 333, doi. 10.1134/S1063785007040189
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- Article
Influence of Rapid Thermal Annealing on the Distribution of Nitrogen Atoms in GaAsN/GaAs.
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- Semiconductors, 2023, v. 57, n. 12, p. 550, doi. 10.1134/S1063782623090105
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Changes in the Electronic Properties of the GaN/Si(111) Surface under Li Adsorption.
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- Semiconductors, 2023, v. 57, n. 11, p. 508, doi. 10.1134/S106378262308016X
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On the Growth of Thin-Film AlGaN/GaN Epitaxial Heterostructures on Hybrid Substrates Containing Layers of Silicon Carbide and Porous Silicon.
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- Semiconductors, 2022, v. 56, n. 4, p. 253, doi. 10.1134/S1063782622040030
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Effect of Pretreatment of the Silicon Substrate on the Properties of GaN Films Grown by Chloride–Hydride Vapor-Phase Epitaxy.
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- Semiconductors, 2021, v. 55, n. 12, p. 995, doi. 10.1134/S1063782621080170
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Photoluminescence Study of AlGaAs/GaAs after Focused Ion Beam Milling.
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- Semiconductors, 2020, v. 54, n. 14, p. 1869, doi. 10.1134/S1063782620140316
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Raman Spectroscopy of GaN Epitaxial Layers Synthesized on Si(111) by Molecular Beam Epitaxy with Nitridation.
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- Semiconductors, 2020, v. 54, n. 14, p. 1847, doi. 10.1134/S1063782620140183
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Influence of a Nanoporous Silicon Layer on the Practical Implementation and Specific Features of the Epitaxial Growth of GaN Layers on SiC/por-Si/c-Si Templates.
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- Semiconductors, 2020, v. 54, n. 5, p. 596, doi. 10.1134/S1063782620050115
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Optical Properties of GaN/SiC/por-Si/Si(111) Hybrid Heterostructures.
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- Semiconductors, 2020, v. 54, n. 4, p. 417, doi. 10.1134/S1063782620040168
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Electronic Structure of SiN Layers on Si(111) and SiC/Si(111) Substrates.
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- Semiconductors, 2019, v. 53, n. 14, p. 1935, doi. 10.1134/S1063782619140239
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Metal-Assisted Photochemical Etching of N- and Ga-Polar GaN Epitaxial Layers.
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- Semiconductors, 2019, v. 53, n. 12, p. 1717, doi. 10.1134/S1063782619160176
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Changes in the Photoluminescence Properties of Semiconductor Heterostructures after Ion-Beam Etching.
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- Semiconductors, 2019, v. 53, n. 11, p. 1545, doi. 10.1134/S1063782619110101
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On the Specific Features of the Plasma-Assisted MBE Synthesis of n<sup>+</sup>-GaN Layers on GaN/c-Al<sub>2</sub>O<sub>3</sub> Templates.
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- Semiconductors, 2019, v. 53, n. 9, p. 1187, doi. 10.1134/S1063782619090112
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Structural and Morphological Properties of Hybrid Heterostructures Based on GaN Grown on a Compliant por-Si(111) Substrate.
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- Semiconductors, 2019, v. 53, n. 8, p. 1120, doi. 10.1134/S1063782619080165
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Investigation into the Influence of a Buffer Layer of Nanoporous Silicon on the Atomic and Electronic Structure and Optical Properties of A<sup>III</sup>N/por-Si Heterostructures Grown by Plasma-Activated Molecular-Beam Epitaxy.
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- Semiconductors, 2019, v. 53, n. 7, p. 993, doi. 10.1134/S1063782619070224
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On the Possibility of Manufacturing Strained InAs/GaSb Superlattices by the MOCVD Method.
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- Semiconductors, 2019, v. 53, n. 2, p. 260, doi. 10.1134/S1063782619020155
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Photoelectric Properties of GaN Layers Grown by Plasma-Assisted Molecular-Beam Epitaxy on Si(111) Substrates and SiC/Si(111) Epitaxial Layers.
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- Semiconductors, 2019, v. 53, n. 2, p. 180, doi. 10.1134/S1063782619020143
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Influence of a por-Si Buffer Layer on the Optical Properties of Epitaxial In<sub>x</sub>Ga<sub>1 –</sub><sub>x</sub>N/Si(111) Heterostructures with a Nanocolumnar Film Morphology.
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- Semiconductors, 2019, v. 53, n. 1, p. 65, doi. 10.1134/S1063782619010172
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Heteroepitaxy of GaP Nucleation Layers on Si by Molecular Beam Epitaxy.
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- Semiconductors, 2018, v. 52, n. 16, p. 2128, doi. 10.1134/S1063782618160327
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Processing of GaN/Si(111) Epitaxial Structures for MEMS Applications.
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- Semiconductors, 2018, v. 52, n. 16, p. 2117, doi. 10.1134/S1063782618160297
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Annealing of FIB-Induced Defects in GaAs/AlGaAs Heterostructure.
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- Semiconductors, 2018, v. 52, n. 14, p. 1898, doi. 10.1134/S1063782618140178
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Effect of a por-Si Buffer Layer on the Structure and Morphology of Epitaxial In<sub>x</sub>Ga<sub>1 - x</sub>N/Si(111) Heterostructures.
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- Semiconductors, 2018, v. 52, n. 13, p. 1653, doi. 10.1134/S106378261813016X
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Features of the Initial Stage of GaN Growth on Si(111) Substrates by Nitrogen-Plasma-Assisted Molecular-Beam Epitaxy.
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- Semiconductors, 2018, v. 52, n. 12, p. 1529, doi. 10.1134/S1063782618120175
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Growth of GaN Layers on Si(111) Substrates by Plasma-Assisted Molecular Beam Epitaxy.
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- Semiconductors, 2018, v. 52, n. 5, p. 660, doi. 10.1134/S1063782618050342
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Optimization of the parameters of HEMT GaN/AlN/AlGaN heterostructures for microwave transistors using numerical simulation.
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- Semiconductors, 2016, v. 50, n. 2, p. 244, doi. 10.1134/S1063782616020263
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Photovoltaic converters of concentrated sunlight, based on InGaAsP(1.0 eV)/InP heterostructures.
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- Semiconductors, 2015, v. 49, n. 5, p. 700, doi. 10.1134/S1063782615050139
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Fabrication and study of <i>p-n</i> structures with crystalline inclusions in the space-charge region.
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- Semiconductors, 2013, v. 47, n. 12, p. 1652, doi. 10.1134/S1063782613120105
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Composite InGaN/GaN/InAlN heterostructures emitting in the yellow-red spectral region.
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- Semiconductors, 2012, v. 46, n. 10, p. 1281, doi. 10.1134/S1063782612100168
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InGaN/GaN heterostructures grown by submonolayer deposition.
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- Semiconductors, 2012, v. 46, n. 10, p. 1335, doi. 10.1134/S106378261210017X
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A monolithic white LED with an active region based on InGaN QWs separated by short-period InGaN/GaN superlattices.
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- Semiconductors, 2010, v. 44, n. 6, p. 808, doi. 10.1134/S1063782610060205
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A study of thermal processes in high-power InGaN/GaN flip-chip LEDs by IR thermal imaging microscopy.
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- Semiconductors, 2010, v. 44, n. 3, p. 373, doi. 10.1134/S1063782610030176
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Active region based on graded-gap InGaN/GaN superlattices for high-power 440- to 470-nm light-emitting diodes.
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- Semiconductors, 2010, v. 44, n. 1, p. 93, doi. 10.1134/S1063782610010161
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Features of molecular beam epitaxy of the GaN (0001) and GaN (000 $$ \bar 1 $$ ) layers with the use of different methods of activation of nitrogen.
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- Semiconductors, 2009, v. 43, n. 8, p. 1058, doi. 10.1134/S1063782609080181
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AlGaN-based quantum-well heterostructures for deep ultraviolet light-emitting diodes grown by submonolayer discrete plasma-assisted molecular-beam epitaxy.
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- Semiconductors, 2008, v. 42, n. 12, p. 1420, doi. 10.1134/S1063782608120099
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Monolithic white LEDs: Approaches, technology, design.
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- Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques, 2012, v. 6, n. 3, p. 501, doi. 10.1134/S1027451012060237
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InAs/GaSb superlattices fabricated by metalorganic chemical vapor deposition.
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- Technical Physics Letters, 2016, v. 42, n. 1, p. 96, doi. 10.1134/S1063785016010284
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MOVPE of III-N LED structures with short technological process.
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- Technical Physics Letters, 2015, v. 41, n. 3, p. 213, doi. 10.1134/S1063785015030116
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AlInAsSb and AlGaInAsSb solid solutions for barrier layers of 3-5 μm spectral range radiation sources obtained by the method of vapor-phase epitaxy from organometallic compounds.
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- Technical Physics Letters, 2012, v. 38, n. 10, p. 900, doi. 10.1134/S1063785012100148
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