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- Title
High Concentration Substitutional N-Doped TiO<sub>2</sub> Film: Preparation, Characterization, and Photocatalytic Property.
- Authors
Jiang, Xudong; Wang, Yongqian; Pan, Chunxu; Hintzen, H.
- Abstract
This article introduces a novel and valid process for preparing a high concentration substitutional N-doped TiO2 photocatalytic film, i.e. firstly the titanium substrate was plasma nitrided and then the N-doped TiO2 was synthesized on the surface of nitrided titanium by using micro-arc oxidation. Compared with the traditional thermal annealing, the present process provides a possibility to increase the nitrogen doping concentration up to 3.21 at.% and x to 0.11 in TiO2- xN x, which exhibits a significant red-shift in the band-gap transition, narrow band gap to 2.6 eV, higher photo-generated charge carrier density and improved photocatalytic property.
- Subjects
THIN films -- Design &; construction; TITANIUM dioxide; ANNEALING of metals; PHOTOCATALYSIS; NITRATION; ULTRAVIOLET radiation; ELECTROLYTES; CATHODES
- Publication
Journal of the American Ceramic Society, 2011, Vol 94, Issue 11, p4078
- ISSN
0002-7820
- Publication type
Article
- DOI
10.1111/j.1551-2916.2011.04692.x