Back to matchesWe found a matchYour institution may have rights to this item. Sign in to continue.TitleSpace charge effects in e-beam projection lithography.AuthorsMkrtchyan, Masis; Liddle, J. Alexander; Harriott, Lloyd R.; Munro, EricAbstractPresents a study which examined the space charge effects in electron beam projection lithography systems. Effects of the Coulomb interactions between particles in a beam; Stochastic trajectory displacement; Global space-charge effect.SubjectsELECTRON beam lithography; MICROELECTRONICSPublicationSolid State Technology, 2000, Vol 43, Issue 7, p241ISSN0038-111XPublication typeArticle