We found a match
Your institution may have rights to this item. Sign in to continue.
- Title
Raith - Electron Beam Lithography for Research.
- Authors
Kirchner, M.; Kahl, M.
- Abstract
The article discusses the study which presents the flexible and maskless technique of an electron beam lithography (EBL) for advanced nanoresearch from Raith GmbH. It notes that the lithography tool consists of several components including the electron source, the electron optics, the deflection unit, and the sample stage. It adds that Raith has developed the scanning electron microscope (SEM) for ultrahigh precision stages and navigation packages for failure analysis applications such as the electron beam lithography (EBL) tool, the EBL process for all types of semiconductors, and the multilayer designs for nanowires.
- Subjects
ELECTRON beam lithography; RAITH GmbH; ELECTRONS; ELECTRON optics; QUANTUM electronics; SCANNING electron microscopes; FAILURE analysis; SEMICONDUCTORS; NANOWIRES
- Publication
Acta Physica Polonica: A, 2009, Vol 116, pS.198
- ISSN
0587-4246
- Publication type
Article
- DOI
10.12693/APhysPolA.116.S-198