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- Title
MORPHOLOGICAL AND COMPOSITIONAL STUDY AT THE Si/Fe INTERFACE OF (Fe/Si) MULTILAYER.
- Authors
BADÍA-ROMANO, L.; RUBÍN, J.; BARTOLOMÉ, F.; BARTOLOMÉ, J.; OVCHINNIKOV, S.; VARNAKOV, S.; MAGÉN, C.; RUBIO-ZUAZO, J.; CASTRO, G. R.
- Abstract
Diffusion and reaction of elements at the interfaces of nanostructured systems play an important role in controlling their physical and chemical properties for subsequent applications. (Fe/Si) nanolayers were prepared by thermal evaporation under ultrahigh vacuum onto a Si(100) substrate. A morphological characterization of these films was performed by combination of scanning transmission electron microscopy (STEM) and X-ray reflectivity (XRR). The compositional depth profile of the (Fe/Si) structures was obtained by angle resolved X-ray photoelectron spectroscopy (ARXPS) and hard X-ray photoelectron spectroscopy (HAXPES). Moreover, determination of the stable phases formed at the Si on Fe interfaces was performed using conversion electron Mossbauer spectroscopy. The Si/Fe interface thickness and roughness were determined to be 1.4 nm and 0.6 nm, respectively. A large fraction of the interface is composed of c-Fe1-xSi paramagnetic phase, though a minoritary ferromagnetic Fe rich silicide phase is also present.
- Publication
SPIN (2010-3247), 2014, Vol 4, Issue 1, p1
- ISSN
2010-3247
- Publication type
Article
- DOI
10.1142/S2010324714400025