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- Title
Surface Topography of Si/TiO 2 Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser Ablation.
- Authors
Moise, Călin Constantin; Pantazi, Aida; Mihai, Geanina Valentina; Jderu, Alin; Bercu, Mircea; Messina, Angelo Alberto; Enăchescu, Marius
- Abstract
This study investigates the surface topography of the deposited thin films versus the distance between target and substrate (dTS) inside a laser ablation equipment. The profile of the rough surface was obtained by atomic force microscopy data analysis based on power spectral density and the roughness-length scale (RLS) functions. The roughing on the top film is analyzed considering the previous topography of the underneath surface for each consecutive TiO2 and Si deposition onto Si (100) wafer. The buried oxide layer inside of Si/TiO2/c-Si structure, obtained by KrF excimer laser ablation was characterized by complementary techniques as spectral ellipsometry, X-ray reflectometry, and X-ray diffraction.
- Subjects
LASER ablation; SURFACE topography; TITANIUM dioxide; SILICON solar cells; EXCIMER lasers; ATOMIC force microscopy; X-ray reflectometry
- Publication
Coatings (2079-6412), 2021, Vol 11, Issue 11, p1350
- ISSN
2079-6412
- Publication type
Article
- DOI
10.3390/coatings11111350