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- Title
High refractive index TiO<sub>2</sub> film deposited by electron beam evaporation.
- Authors
Yao, J. K.; Huang, H. L.; Ma, J. Y.; Jin, Y. X.; Zhao, Y. A.; Shao, J. D.; He, H. B.; Yi, K.; Fan, Z. X.; Zhang, F.; Wu, Z. Y.
- Abstract
The well known 'crystal seed' theory is first applied in this work to prepare TiO2 film: a high refractive index rutile TiO2 film is grown by electron beam evaporation on the rutile seed formed by 1100°C annealing. The average n is larger than 2·4, by far the highest in all the authors' TiO2 films. The films are characterised by optical properties, microstructure and surface morphologies. It is found that the refractive index shows positive relation with the crystal structure, grain size, and packing density and roughness of the film. The film has lower density of granularity and nodule defects on the surface than those of the film deposited by magnetron sputtering. The result shows attractive application in complex filter and laser coatings.
- Subjects
REFRACTION (Optics); ELECTRON beams; DENSITY; ELECTRON optics; THIN films; COATING processes; SURFACES (Technology)
- Publication
Surface Engineering, 2009, Vol 25, Issue 3, p257
- ISSN
0267-0844
- Publication type
Article
- DOI
10.1179/026708408X329498