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- Title
Chemical Composition and Crystalline Phases in F-Doped Tin Oxide Films Grown by DC Reactive Sputtering.
- Authors
Martel, A.; Caballero-Briones, F.; Iribarren, A.; Castro-Rodríguez, R.; Bartolo-Pérez, P.; Peña, J. L.
- Abstract
We study by x-ray diffraction (XRD) the structural variations on a series of SnO[sub x]:F films grown by de reactive sputtering from a metallic tin target in an Ar-O[sub 2]-Freon plasma. We found that the films tend to be crystalline when the stoichiometry approaches to that of SnO or ShO[sub 2], being amorphous in between. We fitted the x-ray diffractograms and found that films are composed by a mixture of compounds, i.e. SnO, Sn[sub 3]O[sub 4], Sh[sub 2]O[sub 3] and ShO[sub 2], given by the simultaneous presence of Sn[sup +2] and Sn[sup +4]. From the analysis of the deconvoluted areas under the x-ray diffractograms we calculate the Sn[sup +2]/Sn and Sn[sup +4]/Sn molar fraction present in the films. The same calculations are done for the x-ray photoelectron spectroscopy (XPS) results. By applying a combinatory model we fitted the general behavior of SnO[sub x] films with different oxygen content versus the Sn[sup +2]/Sn and Sn[sup +4]/Sn molar fraction. Both XRD and XPS results are compared with the theoretical curve, showing a well agreement.
- Subjects
TIN compounds; THIN films; DOPED semiconductors; LIQUID crystal films
- Publication
Modern Physics Letters B, 2001, Vol 15, Issue 17/18/19, p634
- ISSN
0217-9849
- Publication type
Article
- DOI
10.1142/S0217984901002178