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- Title
Calibrating the pupil fill balance for hypernumerical aperture lithographic objective.
- Authors
Dawei Rui; Wei Zhang; Huaijiang Yang
- Abstract
Projection objectives for deep-ultraviolet lithography typically have a dual-telecentric design, and the telecentricity in object space (mask) is idealized as zero. However, for combined illumination and objective lens systems, telecentricity matching on mask can result in a dramatic change in the pupil intensity distribution. Here, we propose a method of identifying the impact of the mismatch on the pupil fill and decoupling the pupil intensity balance from the telecentricity modulation. The technique is implemented in a user-defined program, and a series of simulations for a hypernumerical aperture immersion objective under off-axis illumination conditions verifies the method.
- Subjects
ULTRAVIOLET lithography; PHOTOMASKS; LENSES; LIGHTING research; SIMULATION methods &; models
- Publication
Optical Engineering, 2015, Vol 54, Issue 9, p1
- ISSN
0091-3286
- Publication type
Article
- DOI
10.1117/1.OE.54.9.095103