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- Title
Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation.
- Authors
Golovanov, Anton V.; Luparev, Nikolay V.; Troschiev, Sergey Yu.; Tarelkin, Sergei A.; Shcherbakova, Viktoriia S.; Bormashov, Vitaly S.
- Abstract
Diamond surface modification is one of the most important technological challenges in the creation of diamond quantum photonics devices. It is necessary to fabricate different 3D structures on the crystal surface with both vertical and V‐shaped etching grooves for waveguides, grating couplers, and mesastructures. Herein, the applicability of SF6‐based plasma for diamond processing is studied. SF6 plasma etches diamond five times faster than commonly used Ar/O2 3:1 at the same pressure and bias, but it cannot provide vertical diamond structures due to the ion scattering. Herein, the two‐step plasma processing method is developed with Molybdenum protective masks that provide steep diamond 3D structures with sidewall roughness less than 40 nm and is, therefore, suitable for nanophotonics and other diamond applications. Mo can be chemically patterned by low‐power SF6 plasma and then used as a hardmask for anisotropic etching of diamond in Ar/O2 plasma with a selectivity of 27. Unlike common methods of diamond processing, the proposed two‐step method does not require chlorine.
- Subjects
MOLYBDENUM; NANOPHOTONICS; ION scattering; DIAMOND surfaces; ETCHING; PLASMA etching
- Publication
Physica Status Solidi. A: Applications & Materials Science, 2021, Vol 218, Issue 5, p1
- ISSN
1862-6300
- Publication type
Article
- DOI
10.1002/pssa.202000206