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- Title
Recent Advances in the Plasma-Assisted Synthesis of Silicon-Based Thin Films and Nanostructures.
- Authors
Mandracci, Pietro; Rivolo, Paola
- Abstract
Silicon-based thin films and nanostructures are of paramount importance in a wide range of applications, including microelectronics, photovoltaics, large area sensors, and biomedicine. The wide accessibility of silicon and its relatively low cost have driven a continuous improvement of technology based on this element. Plasma technology has been widely used for the synthesis of coatings and nanostructures based on silicon. Moreover, it has made a fundamental contribution to continuous improvement of the physicochemical properties of silicon-based materials and allows the synthesis of nanometric structures with well-defined shapes and morphologies. In this work, we have reviewed the most interesting developments in plasma-assisted processes for the synthesis of Si-based materials, both inorganic and organic, in the last five years. Special attention has been paid to new techniques, or modifications of already-existing ones, that open up new possibilities for the synthesis of materials with new properties, as well as nanostructures with novel characteristics.
- Subjects
THIN films; NANOSTRUCTURES; PHOTOVOLTAIC power generation; MICROELECTRONICS
- Publication
Coatings (2079-6412), 2023, Vol 13, Issue 6, p1075
- ISSN
2079-6412
- Publication type
Article
- DOI
10.3390/coatings13061075